MBE growth of para-hexaphenyl on GaAs(001)-2×4

The morphology of para-hexaphenyl (PHP) grown on GaAs(001) by molecular beam epitaxy has been studied using atomic force microscopy (AFM). For elevated substrate temperatures between 90 and 170°C and a deposition rate of 0.7 Å s −1, it was found that hexaphenyl on GaAs(001)-2×4 forms well-defined, t...

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Bibliographic Details
Published in:Surface science Vol. 418; no. 1; pp. 256 - 266
Main Authors: Müller, B, Kuhlmann, T, Lischka, K, Schwer, H, Resel, R, Leising, G
Format: Journal Article
Language:English
Published: Lausanne Elsevier B.V 27-11-1998
Amsterdam Elsevier Science
New York, NY
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Summary:The morphology of para-hexaphenyl (PHP) grown on GaAs(001) by molecular beam epitaxy has been studied using atomic force microscopy (AFM). For elevated substrate temperatures between 90 and 170°C and a deposition rate of 0.7 Å s −1, it was found that hexaphenyl on GaAs(001)-2×4 forms well-defined, three-dimensional islands of a rectangular shape oriented in 〈100〉. Their constant width indicates that PHP is epitaxially grown as a coherently strained organic material. The island density shows the Arrhenius behavior resulting in activation barrier of (0.90±0.04) eV. The normalized island size distributions closely resemble that of a critical island size of one. On the basis of the AFM measurements, X-ray diffraction data, and geometrical considerations, we developed a structural model for PHP grown on GaAs(001).
ISSN:0039-6028
1879-2758
DOI:10.1016/S0039-6028(98)00720-1