High performance thin film transistors using low-temperature solution-processed Li-incorporated In2O3/ZrO2 stacks
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Published in: | Microelectronic engineering Vol. 147; pp. 27 - 30 |
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Main Authors: | , , , , , , , , |
Format: | Journal Article |
Language: | English |
Published: |
01-11-2015
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Online Access: | Get full text |
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ISSN: | 0167-9317 |
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DOI: | 10.1016/j.mee.2015.04.060 |