Microscopic evidence of carbide formation at the interface of tungsten-based ohmic contacts on diamond

[Display omitted] •New metal deposition method by EBID was used to grow thin films of W-based contacts.•Ohmic behavior was observed after thermal treatment at 800 K with a specific contact resistance of 2.74 × 10−4 Ω·cm2.•The Z-related contrast in HAADF microscopy allows to identify the W(C), Pt, an...

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Bibliographic Details
Published in:Applied surface science Vol. 667; p. 160429
Main Authors: Valendolf, J., Piñero, J.C., Alba, G., Lloret, F., Fernández, D., Araujo, D.
Format: Journal Article
Language:English
Published: Elsevier B.V 15-09-2024
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Summary:[Display omitted] •New metal deposition method by EBID was used to grow thin films of W-based contacts.•Ohmic behavior was observed after thermal treatment at 800 K with a specific contact resistance of 2.74 × 10−4 Ω·cm2.•The Z-related contrast in HAADF microscopy allows to identify the W(C), Pt, and diamond layers.•STEM-EELS microscopy revealed WC formation on the W-diamond interface after annealing. The fabrication of ohmic contacts is a fundamental technological step toward the development and manufacture of reliable electronic devices. However, in the case of diamond-based devices, there is a lack of knowledge related to the formation of these types of contacts. While the role of interface carbide formation on refractory–metal/diamond contacts has been reported as a key mechanism for the thermal stabilization and optimization of ohmic behaviour; there is still a lack of knowledge, at the diamond/tungsten (W) interface, related to the structural and chemical characteristics versus electrical performance. To fulfil this lack, W onto boron-doped diamond contacts were fabricated on a p+ diamond layer by Electron-Beam Induced Deposition and followed by an annealing process. Then, W-diamond contacts were chemically, electrically, and structurally characterized at room temperature before and after thermal treatment. Once annealed, the Transfer Length Method (TLM) analysis revealed ohmic behaviour with specific contact resistance of 2.74 × 10−4 Ω·cm2. Electron Energy Loss Spectroscopy in Scanning Transmission Electron Microscopy (STEM-EELS) revealed tungsten carbide (WC) formation at the interface after annealing. So, a relation between WC formation and ohmic contact characteristics is demonstrated.
ISSN:0169-4332
1873-5584
DOI:10.1016/j.apsusc.2024.160429