Efficient removal of Ni(II) by nanosecond pulsed discharge‐modified resins: Characterization, capacity, and kinetics

• Published in: Plasma processes and polymers Vol. 20; no. 11
• Main Authors: Wang, Hong‐Li, Chen, Chao‐Jun, Yuan, Hao, Xu, Qing‐Nan, Liang, Jian‐Ping, Li, Si‐Si, Wang, Wen‐Chun, Yang, De‐Zheng
• Format: Journal Article
• Language: English
• Published: Weinheim Wiley Subscription Services, Inc 01-11-2023
• Subjects: Chemisorption; Discharge; Emission standards; Functional groups; Nanosecond pulses; Resins
• ISSN: 1612-8850; 1612-8869
• DOI: 10.1002/ppap.202300033

A porous functionalized resin was produced using nanosecond pulsed discharge for the purpose of removing Ni(II). The implications of discharge time, O
2
concentration, and solution pH on adsorption capacity were explored. Studies indicated that nanosecond pulsed discharge‐modified resins in 5 min of discharge time and 8% of O
2
concentration had a removal efficiency of 97.2%, and an increase of 36% compared to the raw. Furthermore, the residual Ni(II) concentration (0.3 mg/L) is well below the national permitted emission standard (0.5 mg/L). The rise in Ni(II) removal efficiency is associated with the increased specific surface area and oxygen‐containing functional groups. Chemisorption played an important role in the removal of Ni(II) by raw and modified resins.