Ion Beams: In Situ Mitigation of Subsurface and Peripheral Focused Ion Beam Damage via Simultaneous Pulsed Laser Heating (Small 13/2016)

• Published in: Small (Weinheim an der Bergstrasse, Germany) Vol. 12; no. 13; p. 1816
• Main Authors: Stanford, Michael G., Lewis, Brett B., Iberi, Vighter, Fowlkes, Jason D., Tan, Shida, Livengood, Rick, Rack, Philip D.
• Format: Journal Article
• Language: English
• Published: Blackwell Publishing Ltd 01-04-2016
• Subjects: Damage; Defects; direct-write processing; Graphene; graphene milling; Ion beams; laser heating; Lasers; Nanostructure; Pulsed lasers; subsurface damage mitigation; Synthesis (chemistry)
• ISSN: 1613-6810; 1613-6829
• DOI: 10.1002/smll.201670066

Focused ion beam (FIB) processing is an important direct‐write nanoscale synthesis technique; however it generates subsurface defects that can preclude its use for many applications. On page 1779 P.D. Rack and co‐workers demonstrate an in situ laser assisted focused ion beam synthesis approach, which photothermally mitigates the defects generated in silicon during focused He+ and Ne+ exposures. Finally, the group shows that laser assisted FIB reduces the damage generated in graphene nanochannels fabricated via the He+ FIB.