Chemical vapour deposition of TiO and Ti2O3 from TiCl4/H2/CO2 gas mixtures

Chemical vapour deposition of TiO and Ti2O3 from TiCl4/H2/CO2 gas mixtures

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Bibliographic Details
Published in:Surface & coatings technology Vol. 73; no. 3; pp. 160 - 169
Main Authors: FREDRIKSSON, E, CARLSSON, J.-O
Format: Journal Article
Language:English
Published: Lausanne Elsevier 01-08-1995
Subjects:
Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
Cross-disciplinary physics: materials science; rheology
Exact sciences and technology
Materials science
Methods of deposition of films and coatings; film growth and epitaxy
Physics
Interfacial layer
Phase diagrams
Inorganic compounds
Porous materials
Transition element compounds
Binary compounds
Crystal growth from vapors
Experimental study
Substrates
CVD
Titanium oxides
Thermodynamics
Hot wall growth
Morphology
Chemical composition
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Description
ISSN:0257-8972
1879-3347
DOI:10.1016/0257-8972(94)02378-6