Evaporation rate and composition monitoring of electron beam physical vapor deposition processes

Evaporation rate and composition monitoring of electron beam physical vapor deposition processes

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Bibliographic Details
Published in:Surface & coatings technology Vol. 76-77; no. 1-3; pp. 681 - 686
Main Authors: ANKLAM, T. M, BERZINS, L. V, BRAUN, D. G, HAYNAM, C, MEIER, T, MCCLELLAND, M. A
Format: Conference Proceeding Journal Article
Language:English
Published: Lausanne Elsevier 01-12-1995
Subjects:
Cross-disciplinary physics: materials science; rheology
Exact sciences and technology
Materials science
Methods of deposition of films and coatings; film growth and epitaxy
Physics
Thin films
Spectroscopy
Electron beams
Physical vapor deposition
Instrumentation
Experimental study
Monitoring
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Description
ISSN:0257-8972
1879-3347
DOI:10.1016/02578-9729(68)00065-