High rate (~7 nm/s), atmospheric pressure deposition of ZnO front electrode for Cu(In,Ga)Se 2 thin-film solar cells with efficiency beyond 15

Undoped zinc oxide (ZnO) films have been grown on a moving glass substrate by plasma‐enhanced chemical vapor deposition at atmospheric pressure. High deposition rates of ~7 nm/s are achieved at low temperature (200 °C) for a substrate speed from 20 to 60 mm/min. ZnO films are highly transparent in t...

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Bibliographic Details
Published in:Progress in photovoltaics Vol. 21; no. 8; pp. 1559 - 1566
Main Authors: ILLIBERI, Andrea, GROB, Frank, FRIJTERS, Corne, POODT, Paul, RAMACHANDRA, Ram, WINANDS, Hans, SIMOR, Marcel, JAN BOLT, Pieter
Format: Journal Article
Language:English
Published: Bognor Regis Wiley 01-12-2013
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Summary:Undoped zinc oxide (ZnO) films have been grown on a moving glass substrate by plasma‐enhanced chemical vapor deposition at atmospheric pressure. High deposition rates of ~7 nm/s are achieved at low temperature (200 °C) for a substrate speed from 20 to 60 mm/min. ZnO films are highly transparent in the visible range (90%). By a short (~minute) post‐deposition exposure to near‐ultraviolet light, a very low resistivity value of 1.6·10 −3  Ω  cm for undoped ZnO is achieved, which is independent on the film thickness in the range from 180 to 1200 nm. The photo‐enhanced conductivity is stable in time at room temperature when ZnO is coated by an Al 2 O 3 barrier film, deposited by the industrially scalable spatial atomic layer deposition technique. ZnO and Al 2 O 3 films have been used as front electrode and barrier, respectively, in Cu(In,Ga)Se2 (CIGS) solar cells. An average efficiency of 15.4 ± 0.2% (15 cells) is obtained that is similar to the efficiency of CIGS reference cells in which sputtered ZnO:Al is used as electrode. Copyright © 2013 John Wiley & Sons, Ltd.
ISSN:1062-7995
1099-159X
DOI:10.1002/pip.2423