Plasma-facing surface estimation in the presence of oblique magnetic field

Useful analytical approximation formulas for the sheath electric potential profile in the presence of secondary electron emission in oblique magnetic field is suggested.The potential distributions calculated with the proposed model are in good agreement with the respective simulations perfomed with...

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Bibliographic Details
Published in:	Bulletin of the Russian Academy of Sciences. Physics Vol. 80; no. 2; pp. 120 - 124
Main Authors:	Borodkina, I. E., Tsvetkov, I. V.
Format:	Journal Article
Language:	English
Published:	New York Allerton Press 01-02-2016 Springer Nature B.V
Subjects:	Computer simulation Electron emission Hadrons Heavy Ions Inclination angle Magnetic fields Monte Carlo simulation Nuclear Physics Physics Physics and Astronomy Proceedings of the 22nd International Conference “Ion-Surface Interaction (ISI-2015)” Potential Distribution Secondary Electron Emission Electric Field Potential Incline Magnetic Field Floating Potential
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Summary:	Useful analytical approximation formulas for the sheath electric potential profile in the presence of secondary electron emission in oblique magnetic field is suggested.The potential distributions calculated with the proposed model are in good agreement with the respective simulations perfomed with a combined PIC and Monte Carlo code ELECTRAN. The influence of the magnetic field inclination angle on the angular and energy distributions of ions incident on plasma-facing components (PFC) and thus on the effective sputtering yield is analyzed.
ISSN:	1062-8738 1934-9432
DOI:	10.3103/S1062873816020052