Plasma deposition of hydrogenated GeC films in a three-electrode reactor — plasma diagnostics using indirect methods

• Published in: Surface & coatings technology Vol. 74; no. 1-3; pp. 183 - 187
• Main Authors: Szymanowski, H., Gazicki, M., Tyczkowski, J., Olcaytug, F.
• Format: Journal Article Conference Proceeding
• Language: English
• Published: Lausanne Elsevier B.V 01-09-1995; Elsevier
• Subjects: Audiofrequency glow discharge; Cross-disciplinary physics: materials science; rheology; Exact sciences and technology; Gas chromatography; Germanium-carbon films; Indirect plasma diagnostics; Ion and electron beam-assisted deposition; ion plating; Mass spectrometry; Materials science; Methods of deposition of films and coatings; film growth and epitaxy; Physics; Germanium-carbon films; Gas chromatography; Indirect plasma diagnostics; Audiofrequency glow discharge; Mass spectrometry; Thin films; Plasma diagnostics; Ion irradiation; Germanium; Mass spectroscopy; Experimental study; Carbon; Hydrogenation; Plasma deposition; Glow discharges; Deposition process
• ISSN: 0257-8972; 1879-3347
• DOI: 10.1016/0257-8972(95)08227-1

Indirect diagnostics of plasma processes taking place in a novel, three-electrode audiofrequency (20 kHz) reactor during deposition of germanium-carbon films from tetramethylgermanium are presented. The diagnostics consisted in the analysis of low molecular weight products by means of gas chromatography and mass spectrometry. Two methods were employed, micro-cold-finger freezing of the products extracted from the gas phase using a capillary and pyrolysis of the deposited films followed by gas chromatography. In the former case, low molecular weight products of the monomer decomposition in plasma should be identified whereas in the latter only those of the products that take part in the film formation. Application of both methods in the discussed process have shown that, despite dramatic differences in the electronic structure and electrical properties of the films, the principal plasma chemistry is identical. This points to the importance of secondary processes, such as ion bombardment of the growing film, in the formation of the final product. The hypothesis of the ion bombardment effect was confirmed in an experiment with sputter etching of a gold film under different energetic conditions.