Influence of vacuum rapid thermal annealing on the properties of μPCVD SiO2 and SiO2·P2O5 films

Influence of vacuum rapid thermal annealing on the properties of μPCVD SiO2 and SiO2·P2O5 films

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Bibliographic Details
Published in:Vacuum Vol. 58; no. 2-3; pp. 485 - 489
Main Authors: Dimitrov, D.B, Beshkova, M, Dafinova, R
Format: Journal Article
Language:English
Published: 01-08-2000
Online Access:Get full text
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Description
ISSN:0042-207X
DOI:10.1016/S0042-207X(00)00209-8