Growth of ferroelectric PbZr Ti1−O3 thin films by metalorganic chemical vapor deposition (MOCVD)

Growth of ferroelectric PbZr Ti1−O3 thin films by metalorganic chemical vapor deposition (MOCVD)

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Bibliographic Details
Published in:Journal of crystal growth Vol. 237-239; pp. 448 - 454
Main Authors: Shimizu, Masaru, Fujisawa, Hironori, Niu, Hirohiko, Honda, Koichiro
Format: Journal Article
Language:English
Japanese
Published: 01-04-2002
Online Access:Get full text
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Description
ISSN:0022-0248
DOI:10.1016/S0022-0248(01)01968-6