Unmasking the Resolution–Throughput Tradespace of Focused‐Ion‐Beam Machining (Adv. Funct. Mater. 38/2022)

Focused‐Ion‐Beam Machining Sacrificial masking films enable focused‐ion‐beam machining of complex nanostructures beyond the resolution limit of the ion beam, but current understanding of this super‐resolution effect is both empirical and spatial. In article number 2111840, Samuel M. Stavis and co‐wo...

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Bibliographic Details
Published in:	Advanced functional materials Vol. 32; no. 38
Main Authors:	Madison, Andrew C., Villarrubia, John S., Liao, Kuo‐Tang, Copeland, Craig R., Schumacher, Joshua, Siebein, Kerry, Ilic, B. Robert, Liddle, J. Alexander, Stavis, Samuel M.
Format:	Journal Article
Language:	English
Published:	Hoboken Wiley Subscription Services, Inc 01-09-2022
Subjects:	chromium oxide Chromium oxides focused ion beam Ion beams Machining Masking Materials science sacrificial masking, super‐resolution
Online Access:	Get full text
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Summary:	Focused‐Ion‐Beam Machining Sacrificial masking films enable focused‐ion‐beam machining of complex nanostructures beyond the resolution limit of the ion beam, but current understanding of this super‐resolution effect is both empirical and spatial. In article number 2111840, Samuel M. Stavis and co‐workers introduce chromia as a multifuntional masking material and develops new theory that elucidates the resolution–throughput tradespace, revealing that the dominant advantage of the super‐resolution effect is temporal.
ISSN:	1616-301X 1616-3028
DOI:	10.1002/adfm.202270214