P‐61: Development of High Sensitivity PAC material for improve Aligner Lens Mura

Negative PAC is very sensitive to photo and has higher productivity. However, this type is prone to mura formed during the exposure and development. We have been developed lens mura free material. PAC Hole closing caused by increasing photo sensitivity can be solved by Mask OPC technology.

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Bibliographic Details
Published in:	SID International Symposium Digest of technical papers Vol. 48; no. 1; pp. 1472 - 1475
Main Authors:	Na, Younsung, Min, Sungsik, Kang, Dongwoo, Choi, Youngseok, Shin, SangMun
Format:	Journal Article
Language:	English
Published:	Campbell Wiley Subscription Services, Inc 01-05-2017
Subjects:	Alignment Exposure Lens Overlap Mura Lenses Mask Optical Proximity Correction Nikon Exposure PAC Hole Photo Acryl Compound Productivity Sensitivity
Online Access:	Get full text
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Description
Summary:	Negative PAC is very sensitive to photo and has higher productivity. However, this type is prone to mura formed during the exposure and development. We have been developed lens mura free material. PAC Hole closing caused by increasing photo sensitivity can be solved by Mask OPC technology.
ISSN:	0097-966X 2168-0159
DOI:	10.1002/sdtp.11926