Designer Metasurfaces for Antireflective Applications Enabled by Advanced Nanoparticle Technology (Advanced Optical Materials 10/2022)

• Published in: Advanced optical materials Vol. 10; no. 10
• Main Authors: Ray, Nathan J., Yoo, Jae‐Hyuck, Nguyen, Hoang T., Feigenbaum, Eyal
• Format: Journal Article
• Language: English
• Published: United States Wiley 18-05-2022
• Subjects: antireflective coating; MATERIALS SCIENCE; metasurfaces; nanoparticle etching mask; NANOSCIENCE AND NANOTECHNOLOGY; solid state dewetting
• ISSN: 2195-1071; 2195-1071
• DOI: 10.1002/adom.202270037

In article number 2200151, Nathan J. Ray, Jae‐Hyuck Yoo, Hoang T. Nguyen, and Eyal Feigenbaum demonstrate the ability to generate substrate‐engraved metasurfaces that can be tailored within a broad design space to satisfy large‐area antireflective (AR) applications for bandpass or broadband needs. This is done by dry etching through an advanced nanoparticle etching mask, permitting control over the area coverage of the sub‐wavelength metasurface features, as well as the resultant feature lateral spacing, height, and shape. Using this approach, two metasurfaces were fabricated: 1) vertical sidewall nanofeature metasurface for AR applications at 351 nm, and 2) sloped sidewall metasurface designed for broadband ultra‐low reflectance applications. To the best of the authors' knowledge, this is the first demonstration of a broadband AR capable of this performance.