Bandgap Tailoring and Synchronous Microdevices Patterning of Graphene Oxides

• Published in: Journal of physical chemistry. C Vol. 116; no. 5; pp. 3594 - 3599
• Main Authors: Guo, Li, Shao, Rui-Qiang, Zhang, Yong-Lai, Jiang, Hao-Bo, Li, Xian-Bin, Xie, Sheng-Yi, Xu, Bin-Bin, Chen, Qi-Dai, Song, Jun-Feng, Sun, Hong-Bo
• Format: Journal Article
• Language: English
• Published: Columbus, OH American Chemical Society 09-02-2012
• Subjects: Condensed matter: electronic structure, electrical, magnetic, and optical properties; Cross-disciplinary physics: materials science; rheology; Electron states; Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures; Electronic transport phenomena in thin films and low-dimensional structures; Exact sciences and technology; Fullerenes and related materials; diamonds, graphite; Materials science; Methods of electronic structure calculations; Methods of nanofabrication; Nanoscale pattern formation; Physics; Specific materials; Temperature dependence; Radiation effects; Energy gap; Patterning; Laser pulse; Graphene; Field effect transistors; Density functional method; Gates; Nanomaterial synthesis
• ISSN: 1932-7447; 1932-7455
• DOI: 10.1021/jp209843m

Reported here is femtosecond laser mediated bandgap tailoring of graphene oxides (GOs) for direct fabrication of graphene-based microdevices. When femtosecond laser pulses were used to reduce and pattern GO, oxygen contents in the reduced region could be modulated by varying the laser power. In this way, the bandgap of reduced GO was precisely modulated from 2.4 to 0.9 eV by tuning the femtosecond laser power from 0 to 23 mW. Through the first-principle study, the essence of GO bandgap tailoring is proved to be femtosecond laser reduction induced oxygen-content modulation. As representative illustrations, bottom-gate graphene FETs were fabricated in situ by using femtosecond laser reduced GO as the channel material, and an optimized room temperature on–off ratio of 56 is obtained. The controlled reduction of GO by femtosecond laser contributes great potential for bandgap tailoring and microdevices patterning of graphene toward future electronics.