Photochemistry and Patterning of Self-Assembled Monolayer Films Containing Aromatic Hydrocarbon Functional Groups

• Published in: Langmuir Vol. 12; no. 6; pp. 1638 - 1650
• Main Authors: Dulcey, Charles S, Georger, Jacque H, Chen, Mu-San, McElvany, Stephen W, O'Ferrall, C. Elizabeth, Benezra, Valarie I, Calvert, Jeffrey M
• Format: Journal Article
• Language: English
• Published: Washington, DC American Chemical Society 20-03-1996
• Subjects: Chemistry; Exact sciences and technology; General and physical chemistry; Photochemistry; Physical chemistry of induced reactions (with radiations, particles and ultrasonics); Monolayer; Near ultraviolet radiation; Molecular assembly; Autoassembly; Adsorbed state; Benzenic compound; Organic silane; Photochemical reaction; Experimental study; Quantum yield
• ISSN: 0743-7463; 1520-5827
• DOI: 10.1021/la9509514

The deep ultraviolet (λ < ∼250 nm) photochemistry of chemisorbed organosilane self-assembled films of the type R(CH2) n SiO−surface where n = 0, 1, 2 and R = phenyl, naphthyl, or anthracenyl is explored. Photochemistry is examined using 193 and 248 nm laser irradiation as well as deep ultraviolet lamp sources. It is demonstrated for a variety of systems, including single and multiple rings as well as heterocycles, that the primary photochemical mechanism is cleavage of the Si−C bond. Photocleavage of the organic group generates a polar, wettable silanol surface that is amenable to subsequent remodification by organosilane chemisorption, allowing the fabrication of high-resolution patterns of chemical functional groups in a single molecular plane. The use of patterned monolayers as templates of reactivity for subsequent selective chemical reactions is demonstrated.