Local Strain Engineering in Atomically Thin MoS2

Controlling the bandstructure through local-strain engineering is an exciting avenue for tailoring optoelectronic properties of materials at the nanoscale. Atomically thin materials are particularly well-suited for this purpose because they can withstand extreme nonhomogeneous deformations before ru...

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Bibliographic Details
Published in:Nano letters Vol. 13; no. 11; pp. 5361 - 5366
Main Authors: Castellanos-Gomez, Andres, Roldán, Rafael, Cappelluti, Emmanuele, Buscema, Michele, Guinea, Francisco, van der Zant, Herre S. J, Steele, Gary A
Format: Journal Article
Language:English
Published: Washington, DC American Chemical Society 13-11-2013
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Summary:Controlling the bandstructure through local-strain engineering is an exciting avenue for tailoring optoelectronic properties of materials at the nanoscale. Atomically thin materials are particularly well-suited for this purpose because they can withstand extreme nonhomogeneous deformations before rupture. Here, we study the effect of large localized strain in the electronic bandstructure of atomically thin MoS2. Using photoluminescence imaging, we observe a strain-induced reduction of the direct bandgap and funneling of photogenerated excitons toward regions of higher strain. To understand these results, we develop a nonuniform tight-binding model to calculate the electronic properties of MoS2 nanolayers with complex and realistic local strain geometries, finding good agreement with our experimental results.
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ISSN:1530-6984
1530-6992
DOI:10.1021/nl402875m