Oxidative photobleaching of substituted anthracenes in thin polymer films

The photochemical reaction of diphenylanthracene (DPA) and dimethylanthracene (DMA) in thin spin-cast films of various polymers in the presence of oxygen, with direct irradiation as well as triplet sensitization, is reported. Kinetic equations are derived and used in conjunction with the analytical...

Full description

Saved in:
Bibliographic Details
Published in:Journal of physical chemistry (1952) Vol. 94; no. 18; pp. 7194 - 7200
Main Author: Sheats, James R
Format: Journal Article
Language:English
Published: Washington, DC American Chemical Society 01-09-1990
Subjects:
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:The photochemical reaction of diphenylanthracene (DPA) and dimethylanthracene (DMA) in thin spin-cast films of various polymers in the presence of oxygen, with direct irradiation as well as triplet sensitization, is reported. Kinetic equations are derived and used in conjunction with the analytical results of Sheats, Diamond, and Smith to determine reaction parameters from the optical transmittance data. Triplet yields are about 40%. The oxidation rates are substantially lower than in solution, more so for DMA than for DPA. The rate for DPA in poly(ethyl methacrylate) (PEMA) is similar to that in poly(diphenylsiloxane) (PDPS), while in poly(butyl methacrylate) (PBMA) it is significantly faster.
Bibliography:ark:/67375/TPS-2TH7J1NT-0
istex:0BE7FED0249FE30C719CF4B66A240370B792FE3E
ISSN:0022-3654
1541-5740
DOI:10.1021/j100381a045