Oxidative photobleaching of substituted anthracenes in thin polymer films
The photochemical reaction of diphenylanthracene (DPA) and dimethylanthracene (DMA) in thin spin-cast films of various polymers in the presence of oxygen, with direct irradiation as well as triplet sensitization, is reported. Kinetic equations are derived and used in conjunction with the analytical...
Saved in:
Published in: | Journal of physical chemistry (1952) Vol. 94; no. 18; pp. 7194 - 7200 |
---|---|
Main Author: | |
Format: | Journal Article |
Language: | English |
Published: |
Washington, DC
American Chemical Society
01-09-1990
|
Subjects: | |
Online Access: | Get full text |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Summary: | The photochemical reaction of diphenylanthracene (DPA) and dimethylanthracene (DMA) in thin spin-cast films of various polymers in the presence of oxygen, with direct irradiation as well as triplet sensitization, is reported. Kinetic equations are derived and used in conjunction with the analytical results of Sheats, Diamond, and Smith to determine reaction parameters from the optical transmittance data. Triplet yields are about 40%. The oxidation rates are substantially lower than in solution, more so for DMA than for DPA. The rate for DPA in poly(ethyl methacrylate) (PEMA) is similar to that in poly(diphenylsiloxane) (PDPS), while in poly(butyl methacrylate) (PBMA) it is significantly faster. |
---|---|
Bibliography: | ark:/67375/TPS-2TH7J1NT-0 istex:0BE7FED0249FE30C719CF4B66A240370B792FE3E |
ISSN: | 0022-3654 1541-5740 |
DOI: | 10.1021/j100381a045 |