Atomic Layer Deposition of Aluminum Metal Films Using a Thermally Stable Aluminum Hydride Reducing Agent

Atomic Layer Deposition of Aluminum Metal Films Using a Thermally Stable Aluminum Hydride Reducing Agent

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Bibliographic Details
Published in:Chemistry of materials Vol. 30; no. 6; pp. 1844 - 1848
Main Authors: Blakeney, Kyle J, Winter, Charles H
Format: Journal Article
Language:English
Published: American Chemical Society 27-03-2018
Online Access:Get full text
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Description
ISSN:0897-4756
1520-5002
DOI:10.1021/acs.chemmater.8b00445