Low temperature chemical vapour deposition of diamond on tungsten carbides using CF sub 4 gas doping for machine tool applications

The improvement is reported of the adhesion of CVD diamond films on WC-Co (6%) tools and the enhancement in the cutting tool lifetime by the introduction of CF sub 4 in the CH sub 4 /H sub 2 gas mixture. By the use of this halogen precursor it was possible to reduce the substrate temperature during...

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Bibliographic Details

Published in:	Vacuum Vol. 46; no. 1; pp. 5 - 8
Main Authors:	Trava-Airoldi, V J, Nobrega, B N, Corat, E J, del Bosco, E, Leite, N F, Baranauskas, V
Format:	Journal Article
Language:	English
Published:	01-01-1995
Online Access:	Get full text
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