Low temperature chemical vapour deposition of diamond on tungsten carbides using CF sub 4 gas doping for machine tool applications

• Published in: Vacuum Vol. 46; no. 1; pp. 5 - 8
• Main Authors: Trava-Airoldi, V J, Nobrega, B N, Corat, E J, del Bosco, E, Leite, N F, Baranauskas, V
• Format: Journal Article
• Language: English
• Published: 01-01-1995
• ISSN: 0042-207X

The improvement is reported of the adhesion of CVD diamond films on WC-Co (6%) tools and the enhancement in the cutting tool lifetime by the introduction of CF sub 4 in the CH sub 4 /H sub 2 gas mixture. By the use of this halogen precursor it was possible to reduce the substrate temperature during the deposition without degradation in the diamond film quality. The low temperature deposition improves the smoothness of the coating and minimizes the thermal stress induced by the CVD process.