Electrical resistance in ion beam mixed Al/Si thin films

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Bibliographic Details
Published in:	Japanese journal of applied physics Vol. 26; no. 3; pp. 707 - 708
Main Authors:	XIAO-XING XI, QI-ZE RAN, JIA-RUI LIU, WEI-YAN GUAN
Format:	Conference Proceeding
Language:	English
Published:	Tokyo Japanese journal of applied physics 1987
Subjects:	Condensed matter: electronic structure, electrical, magnetic, and optical properties Cross-disciplinary physics: materials science; rheology Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures Electronic transport in interface structures Exact sciences and technology Materials science Metals, semimetals and alloys Physics Specific materials Electrical conductivity Disordered system Multiple layer Temperature effect Composition effect Ions Electron localization Granular structure Thin film Irradiation Ion mixing Chemical composition Silicon Low temperature
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