Explanation of threshold voltage scaling in enhancement-mode InAIN/AIN-GaN metal oxide semiconductor high electron mobility transistors on Si substrates

Saved in:
Bibliographic Details
Published in:Thin solid films Vol. 520; no. 19; pp. 6230 - 6232
Main Authors: ALEXEWICZ, A, OSTERMAIER, C, HENKEL, C, BETHGE, O, CARLIN, J.-F, LUGANI, L, GRANDJEAN, N, BERTAGNOLLI, E, POGANY, D, STRASSER, G
Format: Journal Article
Language:English
Published: Amsterdam Elsevier 2012
Subjects:
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Author BETHGE, O
ALEXEWICZ, A
CARLIN, J.-F
POGANY, D
OSTERMAIER, C
STRASSER, G
LUGANI, L
BERTAGNOLLI, E
HENKEL, C
GRANDJEAN, N
Author_xml – sequence: 1
  givenname: A
  surname: ALEXEWICZ
  fullname: ALEXEWICZ, A
  organization: Vienna University of Technology, Floragasse 7, 1040 Vienna, Austria
– sequence: 2
  givenname: C
  surname: OSTERMAIER
  fullname: OSTERMAIER, C
  organization: Vienna University of Technology, Floragasse 7, 1040 Vienna, Austria
– sequence: 3
  givenname: C
  surname: HENKEL
  fullname: HENKEL, C
  organization: Vienna University of Technology, Floragasse 7, 1040 Vienna, Austria
– sequence: 4
  givenname: O
  surname: BETHGE
  fullname: BETHGE, O
  organization: Vienna University of Technology, Floragasse 7, 1040 Vienna, Austria
– sequence: 5
  givenname: J.-F
  surname: CARLIN
  fullname: CARLIN, J.-F
  organization: Eole Polytechnique Fédérate de Lausanne, Station 3, 1015 Lausanne, Switzerland
– sequence: 6
  givenname: L
  surname: LUGANI
  fullname: LUGANI, L
  organization: Eole Polytechnique Fédérate de Lausanne, Station 3, 1015 Lausanne, Switzerland
– sequence: 7
  givenname: N
  surname: GRANDJEAN
  fullname: GRANDJEAN, N
  organization: Eole Polytechnique Fédérate de Lausanne, Station 3, 1015 Lausanne, Switzerland
– sequence: 8
  givenname: E
  surname: BERTAGNOLLI
  fullname: BERTAGNOLLI, E
  organization: Vienna University of Technology, Floragasse 7, 1040 Vienna, Austria
– sequence: 9
  givenname: D
  surname: POGANY
  fullname: POGANY, D
  organization: Vienna University of Technology, Floragasse 7, 1040 Vienna, Austria
– sequence: 10
  givenname: G
  surname: STRASSER
  fullname: STRASSER, G
  organization: Vienna University of Technology, Floragasse 7, 1040 Vienna, Austria
BackLink http://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=26144083$$DView record in Pascal Francis
BookMark eNqNTstOwzAQtFArkUL_YS8cI5yH-jgiVKCXXuBeuc4mWWSvI6-L2j_hczESH8BhNNI8NLNQMw6MN6qoNuttWa-baqYKrVtdrvRW36qFyKfWuqrrplDfu8vkDJtEgSH0kMaIMgbXwVdwyQwIYo0jHoAYkEfDFj1yKn3oEPb8tD88ZpSv5gAek3EQLpQdQU82cHe2KUQYaRgBHdoU84wPJ3KUrpCiYSHJCYGsvxPI-SRZTSj3at4bJ7j84zv18LL7eH4rJ_P7qM9VS3KcInkTr8d6VbWt3jTNf3M_1zZfJw
CODEN THSFAP
ContentType Journal Article
Copyright 2015 INIST-CNRS
Copyright_xml – notice: 2015 INIST-CNRS
DBID IQODW
DatabaseName Pascal-Francis
DeliveryMethod fulltext_linktorsrc
Discipline Engineering
Applied Sciences
Physics
EISSN 1879-2731
EndPage 6232
ExternalDocumentID 26144083
GroupedDBID --K
--M
-~X
.DC
.~1
0R~
123
1B1
1RT
1~.
1~5
29Q
4.4
457
4G.
5VS
6TJ
7-5
71M
8P~
9JN
AABNK
AABXZ
AACTN
AAEDT
AAEDW
AAEPC
AAIAV
AAIKJ
AAKOC
AALRI
AAOAW
AAQFI
AAQXK
AAXUO
AAYJJ
ABFNM
ABFRF
ABMAC
ABNEU
ABPIF
ABPTK
ABXDB
ABXRA
ABYKQ
ACBEA
ACDAQ
ACFVG
ACGFO
ACGFS
ACNNM
ACRLP
ADBBV
ADEZE
ADMUD
AEBSH
AEFWE
AEKER
AENEX
AEZYN
AFFNX
AFKWA
AFTJW
AGHFR
AGUBO
AGYEJ
AHHHB
AIEXJ
AIKHN
AITUG
AIVDX
AJBFU
AJOXV
ALMA_UNASSIGNED_HOLDINGS
AMFUW
AMRAJ
ASPBG
AVWKF
AXJTR
AZFZN
BBWZM
BKOJK
BLXMC
CS3
DU5
EBS
EFJIC
EJD
EO8
EO9
EP2
EP3
F5P
FDB
FEDTE
FGOYB
FIRID
FNPLU
FYGXN
G-2
G-Q
G8K
GBLVA
HMV
HX~
HZ~
IHE
IQODW
J1W
KOM
M24
M38
M41
MAGPM
MO0
N9A
NDZJH
O-L
O9-
OAUVE
OGIMB
OZT
P-8
P-9
P2P
PC.
Q38
R2-
RIG
RNS
ROL
RPZ
SDF
SDG
SDP
SES
SEW
SMS
SPC
SPCBC
SPD
SPG
SSM
SSQ
SSZ
T5K
TWZ
VOH
WH7
WUQ
XFK
ZMT
~G-
ID FETCH-pascalfrancis_primary_261440833
ISSN 0040-6090
IngestDate Sun Oct 29 17:08:24 EDT 2023
IsPeerReviewed true
IsScholarly true
Issue 19
Keywords Voltage threshold
Interlayers
High electron mobility transistor (HEMT)
Aluminium nitride
InAIN/GaN heterostructure
Normally-off
Leakage currents
Gallium nitride
III-V compound
Interfaces
Zirconium oxide
Gate oxide
Gallium tellurides
Scaling laws
Drain current
Logic gates
Enhancement-mode (E-mode)
High electron mobility transistors
Gates
Heterostructures
III-V semiconductors
Language English
License CC BY 4.0
LinkModel OpenURL
MergedId FETCHMERGED-pascalfrancis_primary_261440833
ParticipantIDs pascalfrancis_primary_26144083
PublicationCentury 2000
PublicationDate 2012
PublicationDateYYYYMMDD 2012-01-01
PublicationDate_xml – year: 2012
  text: 2012
PublicationDecade 2010
PublicationPlace Amsterdam
PublicationPlace_xml – name: Amsterdam
PublicationTitle Thin solid films
PublicationYear 2012
Publisher Elsevier
Publisher_xml – name: Elsevier
SSID ssj0001223
Score 4.110292
SourceID pascalfrancis
SourceType Index Database
StartPage 6230
SubjectTerms Applied sciences
Cross-disciplinary physics: materials science; rheology
Electronics
Exact sciences and technology
Materials science
Other semiconductors
Physics
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Specific materials
Transistors
Title Explanation of threshold voltage scaling in enhancement-mode InAIN/AIN-GaN metal oxide semiconductor high electron mobility transistors on Si substrates
Volume 520
hasFullText 1
inHoldings 1
isFullTextHit
isPrint
link http://sdu.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwtV1LT8JAEN4gxkQPPlDjk8xBT00VyqPtEbECiuUAicSLKX3EHmyNC4n-E3-uM9sHCwcfBy8NXZqm7fdl5tvZ2RnGzurkxjQzUN2a2VBJsKuGMamqesOcNING4AYexSG7Q90eG9dW3SoUshZc87F_RRrHEGvaOfsHtPOb4gD-RszxiKjj8Ve4U1KdE-VCcIpYcVpiUtAOTSlBhyMq6UYWP3om0ClAqFJLHLQWrZ5NJRZ6ttpxbOovTWL1PcT_OKXRxxHVh43fFCpzrGQ9dJSXWOTYflDHiYiLyiNiGWIYKhwtk6iAy2UdTO1CFfwQoUeVoV5yYd_qW2Prodd-XAizDoYouu9bvSRrI4_rdi37zuovDF1Zo25HJHgO5HhGdT7vzbbYyOaa9iZUkn6iF35ioQ3dpP1EVdmEN7SKzFVTssgo7yqSd8dTbe76suX-JY-Y5ylqNF1GkUrFEVCIFdkqvur4Nnf1VU3L0zLpOSmz1iEYg6QriiRVRttsM51jQCshxw4r-FGJbaXzDUitOS-xDakYZYmtiWRgl--yT4lDEAeQcwhSDkHKIQgjWOYQCA5dpgwCwSAQDIIFBgExCDIGQcYgkBgEOD4MYc6gPXZ-Y43aXXXh9Z9ek4opT9l3rO2zYhRH_gEDlJr6BJ2b4dRNtBDOxGsaru56BvXmrLn1Q1b-_l5HP11wzNaJX0m87IQVp28z_5StcG9WTnH8Au4rgFg
link.rule.ids 315,782,786,4028
linkProvider Elsevier
openUrl ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Ajournal&rft.genre=article&rft.atitle=Explanation+of+threshold+voltage+scaling+in+enhancement-mode+InAIN%2FAIN-GaN+metal+oxide+semiconductor+high+electron+mobility+transistors+on+Si+substrates&rft.jtitle=Thin+solid+films&rft.au=ALEXEWICZ%2C+A&rft.au=OSTERMAIER%2C+C&rft.au=HENKEL%2C+C&rft.au=BETHGE%2C+O&rft.date=2012&rft.pub=Elsevier&rft.issn=0040-6090&rft.eissn=1879-2731&rft.volume=520&rft.issue=19&rft.spage=6230&rft.epage=6232&rft.externalDBID=n%2Fa&rft.externalDocID=26144083
thumbnail_l http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/lc.gif&issn=0040-6090&client=summon
thumbnail_m http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/mc.gif&issn=0040-6090&client=summon
thumbnail_s http://covers-cdn.summon.serialssolutions.com/index.aspx?isbn=/sc.gif&issn=0040-6090&client=summon