Global model of Ar, O[sub 2], Cl[sub 2], and Ar/O[sub 2] high-density plasma discharges

We develop a global (volume averaged) model of high-density plasma discharges in molecular gases. For a specified discharge length and diameter, absorbed power, pressure, and feed gas composition, as well as the appropriate reaction rate coefficients and surface recombination constants, we solve the...

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Bibliographic Details
Published in:	Journal of vacuum science & technology. A, Vacuum, surfaces, and films Vol. 13:2
Main Authors:	Lee, C., Lieberman, M.A.
Format:	Journal Article
Language:	English
Published:	United States 01-03-1995
Subjects:	661300 - Other Aspects of Physical Science- (1992-) ARGON CHLORINE CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS ELECTRIC DISCHARGES ELECTRON TEMPERATURE ELEMENTS FLUIDS GASES HALOGENS MATHEMATICAL MODELS NONMETALS OXYGEN PLASMA DENSITY PRESSURE DEPENDENCE RARE GASES RECOMBINATION
Online Access:	Get full text
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