Effect of ion treatment on the properties of In{sub 2}O{sub 3}:Sn films

Effect of ion treatment on the properties of In{sub 2}O{sub 3}:Sn films

Variations in the properties of Indium-Tin-Oxide (ITO) films grown by reactive HF (high-frequency) magnetron deposition with simultaneous ion treatment are studied depending on the ion-treatment current and substrate temperature. Ion treatment of the growing film during deposition insignificantly ch...

Full description

Saved in:
Bibliographic Details
Published in:Semiconductors (Woodbury, N.Y.) Vol. 47; no. 6
Main Authors: Krylov, P. N., Zakirova, R. M., Fedotova, I. V., Gilmutdinov, F. Z.
Format: Journal Article
Language:English
Published: United States 15-06-2013
Subjects:
ABSORPTION
CRYSTALLIZATION
DEPOSITION
INDIUM OXIDES
ION TEMPERATURE
MAGNETRONS
MATERIALS SCIENCE
TEMPERATURE RANGE 0273-0400 K
THIN FILMS
TIN OXIDES
X RADIATION
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:Variations in the properties of Indium-Tin-Oxide (ITO) films grown by reactive HF (high-frequency) magnetron deposition with simultaneous ion treatment are studied depending on the ion-treatment current and substrate temperature. Ion treatment of the growing film during deposition insignificantly changes the relative content of tin and indium, but significantly increases the conductivity. Films obtained at a temperature below 50 Degree-Sign C without ion treatment are X-ray amorphous. Ion treatment and an increase in the condensation temperature lead to film crystallization and a shift of the optical absorption edge to short wave-lengths. An increase in the ion-treatment current causes texture formation.
ISSN:1063-7826
1090-6479
DOI:10.1134/S1063782613060146