Investigation on anti-reflection coating for high resistance to potential induced degradation

Investigation on anti-reflection coating for high resistance to potential induced degradation

This paper is focusing on a relationship between potential induced degradation (PID) and characteristics of anti-reflection coating (ARC). The module, which has an ARC deposited by plasma-enhanced chemical vapor deposition (PE-CVD) from Shimadzu Corporation, indicated high resistance to PID with kee...

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Published in:2013 Twentieth International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD) pp. 257 - 258
Main Authors: Mishina, Ken, Ogishi, Atsufumi, Ueno, Kiyoshi, Doi, Takuya, Hara, Kohjiro, Ikeno, Norihiro, Imai, Daisuke, Saruwatari, Tetsuya, Yamazaki, Toshiharu, Ogura, Atsushi, Ohshita, Yoshio, Masuda, Atsushi
Format: Conference Proceeding
Language:English
Published: JSAP 01-07-2013
Subjects:
Coatings
Conductivity
Corrosion
Degradation
Resistance
Silicon compounds
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Abstract This paper is focusing on a relationship between potential induced degradation (PID) and characteristics of anti-reflection coating (ARC). The module, which has an ARC deposited by plasma-enhanced chemical vapor deposition (PE-CVD) from Shimadzu Corporation, indicated high resistance to PID with keeping conventional refractive index. This ARC had a property of high conductivity and low oxygen concentration.
AbstractList This paper is focusing on a relationship between potential induced degradation (PID) and characteristics of anti-reflection coating (ARC). The module, which has an ARC deposited by plasma-enhanced chemical vapor deposition (PE-CVD) from Shimadzu Corporation, indicated high resistance to PID with keeping conventional refractive index. This ARC had a property of high conductivity and low oxygen concentration.
Author Ueno, Kiyoshi
Masuda, Atsushi
Hara, Kohjiro
Imai, Daisuke
Mishina, Ken
Ogishi, Atsufumi
Doi, Takuya
Yamazaki, Toshiharu
Ohshita, Yoshio
Ikeno, Norihiro
Saruwatari, Tetsuya
Ogura, Atsushi
Author_xml – sequence: 1
  givenname: Ken
  surname: Mishina
  fullname: Mishina, Ken
  email: ken_m@shimadzu.co.jp
  organization: Equip. Dept., Shimadzu Corp., Hadano, Japan
– sequence: 2
  givenname: Atsufumi
  surname: Ogishi
  fullname: Ogishi, Atsufumi
  organization: Equip. Dept., Shimadzu Corp., Hadano, Japan
– sequence: 3
  givenname: Kiyoshi
  surname: Ueno
  fullname: Ueno, Kiyoshi
  organization: Choshu Ind. Co., Ltd., Japan
– sequence: 4
  givenname: Takuya
  surname: Doi
  fullname: Doi, Takuya
  organization: Nat. Inst. of Adv. Ind. Sci. & Technol. (AIST), Tsukuba, Japan
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  givenname: Kohjiro
  surname: Hara
  fullname: Hara, Kohjiro
  organization: Nat. Inst. of Adv. Ind. Sci. & Technol. (AIST), Tsukuba, Japan
– sequence: 6
  givenname: Norihiro
  surname: Ikeno
  fullname: Ikeno, Norihiro
  organization: Meiji Univ., Kawasaki, Japan
– sequence: 7
  givenname: Daisuke
  surname: Imai
  fullname: Imai, Daisuke
  organization: Equip. Dept., Shimadzu Corp., Hadano, Japan
– sequence: 8
  givenname: Tetsuya
  surname: Saruwatari
  fullname: Saruwatari, Tetsuya
  organization: Equip. Dept., Shimadzu Corp., Hadano, Japan
– sequence: 9
  givenname: Toshiharu
  surname: Yamazaki
  fullname: Yamazaki, Toshiharu
  organization: Choshu Ind. Co., Ltd., Japan
– sequence: 10
  givenname: Atsushi
  surname: Ogura
  fullname: Ogura, Atsushi
  organization: Meiji Univ., Kawasaki, Japan
– sequence: 11
  givenname: Yoshio
  surname: Ohshita
  fullname: Ohshita, Yoshio
  organization: Toyota Technol. Inst., Toyota, Japan
– sequence: 12
  givenname: Atsushi
  surname: Masuda
  fullname: Masuda, Atsushi
  organization: Nat. Inst. of Adv. Ind. Sci. & Technol. (AIST), Tsukuba, Japan
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Snippet This paper is focusing on a relationship between potential induced degradation (PID) and characteristics of anti-reflection coating (ARC). The module, which...
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StartPage 257
SubjectTerms Coatings
Conductivity
Corrosion
Degradation
Resistance
Silicon compounds
Title Investigation on anti-reflection coating for high resistance to potential induced degradation
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