Investigation on anti-reflection coating for high resistance to potential induced degradation

This paper is focusing on a relationship between potential induced degradation (PID) and characteristics of anti-reflection coating (ARC). The module, which has an ARC deposited by plasma-enhanced chemical vapor deposition (PE-CVD) from Shimadzu Corporation, indicated high resistance to PID with kee...

Full description

Saved in:
Bibliographic Details
Published in:2013 Twentieth International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD) pp. 257 - 258
Main Authors: Mishina, Ken, Ogishi, Atsufumi, Ueno, Kiyoshi, Doi, Takuya, Hara, Kohjiro, Ikeno, Norihiro, Imai, Daisuke, Saruwatari, Tetsuya, Yamazaki, Toshiharu, Ogura, Atsushi, Ohshita, Yoshio, Masuda, Atsushi
Format: Conference Proceeding
Language:English
Published: JSAP 01-07-2013
Subjects:
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:This paper is focusing on a relationship between potential induced degradation (PID) and characteristics of anti-reflection coating (ARC). The module, which has an ARC deposited by plasma-enhanced chemical vapor deposition (PE-CVD) from Shimadzu Corporation, indicated high resistance to PID with keeping conventional refractive index. This ARC had a property of high conductivity and low oxygen concentration.