Self-organized anisotropic (Zr1- x Si x )N y nanocomposites grown by reactive sputter deposition

The physical properties of hard and superhard nanocomposite thin films are strongly dependent on their nanostructure. Here, we present the results of an investigation of nanostructural evolution and the resulting mechanical properties of (Zr1- x Si x )N y films, with 0 x 1 and 1 y 1.27, grown on MgO...

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Published in:Acta materialia Vol. 82; pp. 179 - 189
Main Authors: Ghafoor, Naureen, Petrov, Ivan, Klenov, Dmitri O, Freitag, Bert, Jensen, Jens, Greene, JE, Hultman, Lars, Oden, Magnus
Format: Journal Article
Language:English
Published: 01-01-2015
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Abstract The physical properties of hard and superhard nanocomposite thin films are strongly dependent on their nanostructure. Here, we present the results of an investigation of nanostructural evolution and the resulting mechanical properties of (Zr1- x Si x )N y films, with 0 x 1 and 1 y 1.27, grown on MgO(001) and Al2O3(0001) substrates at temperatures T s =500-900 degree C by reactive magnetron sputter deposition from Zr and Si targets. X-ray diffraction and transmission electron microscopy (TEM) results show that there is a T s/composition window in which stoichiometric Zr-Si-N and amorphous a-Si3N4 phases mutually segregate and self-organize into encapsulated 3-5nm wide ZrN-rich (Zr1- x Si x )N columns which extend along the growth direction with a strong (002) texture. Lattice-resolved scanning TEM and energy-dispersive X-ray spectroscopy reveal that the (Zr1- x Si x )N y nanocolumns are separated by a bilayer tissue phase consisting of a thin crystalline SiN y -rich (Zr1- x Si x )N y layer with an a-Si3N4 overlayer. Incorporation of metastable SiN into NaCl-structure ZrN leads to an enhanced nanoindentation hardness H which is a function of T s and film composition. For nanocomposites with composition (Zr0.8Si0.2)N1.14 (10at.% Si) H, increases from 26GPa at 500 degree C to 37GPa at 900 degree C. For comparison, the hardness of epitaxial ZrN/MgO(001) layers grown at T s =800 degree C is 24GPa.
AbstractList The physical properties of hard and superhard nanocomposite thin films are strongly dependent on their nanostructure. Here, we present the results of an investigation of nanostructural evolution and the resulting mechanical properties of (Zr1- x Si x )N y films, with 0 x 1 and 1 y 1.27, grown on MgO(001) and Al2O3(0001) substrates at temperatures T s =500-900 degree C by reactive magnetron sputter deposition from Zr and Si targets. X-ray diffraction and transmission electron microscopy (TEM) results show that there is a T s/composition window in which stoichiometric Zr-Si-N and amorphous a-Si3N4 phases mutually segregate and self-organize into encapsulated 3-5nm wide ZrN-rich (Zr1- x Si x )N columns which extend along the growth direction with a strong (002) texture. Lattice-resolved scanning TEM and energy-dispersive X-ray spectroscopy reveal that the (Zr1- x Si x )N y nanocolumns are separated by a bilayer tissue phase consisting of a thin crystalline SiN y -rich (Zr1- x Si x )N y layer with an a-Si3N4 overlayer. Incorporation of metastable SiN into NaCl-structure ZrN leads to an enhanced nanoindentation hardness H which is a function of T s and film composition. For nanocomposites with composition (Zr0.8Si0.2)N1.14 (10at.% Si) H, increases from 26GPa at 500 degree C to 37GPa at 900 degree C. For comparison, the hardness of epitaxial ZrN/MgO(001) layers grown at T s =800 degree C is 24GPa.
The physical properties of hard and superhard nanocomposite thin films are strongly dependent on their nanostructure. Here, we present the results of an investigation of nanostructural evolution and the resulting mechanical properties of (Zr1-xSix)N-y films, with 0 less than= x less than= 1 and 1 less than= y less than= 1.27, grown on MgO(0 0 1) and Al2O3(0 0 0 1) substrates at temperatures T-s = 500-900 degrees C by reactive magnetron sputter deposition from Zr and Si targets. X-ray diffraction and transmission electron microscopy (TEM) results show that there is a T-s/composition window in which stoichiometric Zr-Si-N and amorphous a-Si3N4 phases mutually segregate and self-organize into encapsulated 3-5 um wide ZrN-rich (Zr1-xSix)N columns which extend along the growth direction with a strong (002) texture. Lattice-resolved scanning TEM and energy-dispersive X-ray spectroscopy reveal that the (Zr1-xSix)N-y nanocolumns are separated by a bilayer tissue phase consisting of a thin crystalline SiNy-rich (Zr1-xSix)N-y layer with an a-Si3N4 overlayer. Incorporation of metastable SiN into NaCl-structure ZrN leads to an enhanced nanoindentation hardness H which is a function of T-s and film composition. For nanocomposites with composition (Zr(0.8)Sio(0.2))N-1.14 (10 at.% Si) H, increases from 26 GPa at 500 degrees C to 37 GPa at 900 degrees C. For comparison, the hardness of epitaxial ZrN/MgO(0 0 1) layers grown at T-s = 800 degrees C is 24 GPa. (C) 2014 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.
Author Petrov, Ivan
Hultman, Lars
Freitag, Bert
Ghafoor, Naureen
Klenov, Dmitri O
Oden, Magnus
Jensen, Jens
Greene, JE
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Keywords ZrSiN nanocomposites
Magnetron sputtering
Hard coatings
Nanoindentation
Self-organization
Language English
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Snippet The physical properties of hard and superhard nanocomposite thin films are strongly dependent on their nanostructure. Here, we present the results of an...
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SubjectTerms Deposition
Nanocomposites
Nanostructure
Silicon
Silicon substrates
Texture
Transmission electron microscopy
Zirconium base alloys
Title Self-organized anisotropic (Zr1- x Si x )N y nanocomposites grown by reactive sputter deposition
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