Design and application of gray field technology for defect inspection systems

Design and application of gray field technology for defect inspection systems

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Bibliographic Details
Main Authors: WRIGHT, Paul J, RHEINHORN, Silviu, SOME, Daniel
Format: Conference Proceeding
Language:English
Published: Piscataway NJ IEEE 2001
Subjects:
Applied sciences
Electronics
Exact sciences and technology
Microelectronic fabrication (materials and surfaces technology)
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Testing, measurement, noise and reliability
Performance evaluation
Scanning electron microscopy
Methodology
Light scattering
Defect shape
Automatic optical inspection
Implementation
Microelectronic fabrication
Ultraviolet radiation
Experimental result
Gray scale
Detecting equipment
Imaging
Optical properties
Numerical simulation
Control method
Wafer
Defect detection
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Description
ISBN:9780780365551
0780365550
DOI:10.1109/ASMC.2001.925650