Modelling of noble gas-SiH4 gas mixture glow discharge positive column plasmas

Modelling of noble gas-SiH4 gas mixture glow discharge positive column plasmas

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Bibliographic Details
Published in:Japanese journal of applied physics Vol. 33; no. 7B; pp. 4285 - 4291
Main Authors: JEN-SHIH CHANG, KIKUCHI, M, BEREZIN, A. A, HOBSON, R. M, MATSUMARA, S, SHINRIKI TEII
Format: Conference Proceeding
Language:English
Published: Tokyo Japanese journal of applied physics 01-07-1994
Subjects:
Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
Chemistry
Cross-disciplinary physics: materials science; rheology
Exact sciences and technology
General and physical chemistry
Materials science
Methods of deposition of films and coatings; film growth and epitaxy
Physics
Physics of gases, plasmas and electric discharges
Physics of plasmas and electric discharges
Plasma production and heating
Plasma reactions (including flowing afterglow and electric discharges)
Plasma sources
Theory of reactions, general kinetics
Theory of reactions, general kinetics. Catalysis. Nomenclature, chemical documentation, computer chemistry
Silanes
Positive column
Materials processing reactors
Medium vacuum
Electric discharges
Chemical reactions
Computerized simulation
Binary mixtures
Chemical vapor deposition
Rare gases
Plasma sources
Proceedings
Low pressure
Kinetics
Glow discharges
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Description
ISSN:0021-4922
1347-4065
DOI:10.1143/JJAP.33.4285