Normal Photoelectron Diffraction of the Se 3d Level in Se Overlayers on Ni(100)

Normal Photoelectron Diffraction of the Se 3d Level in Se Overlayers on Ni(100)

Modulations of up to a factor of two were observed in the Se 3d photoelectron intensity normal to the surface, for Se overlayers on Ni(100), as the photon energy was varied from 90 to 240 eV. Excellent agreement of energies with predictions by Tong and Li was obtained for both the c(2 2) and p(2 x 2...

Full description

Saved in:
Bibliographic Details
Published in:Physical review letters Vol. 41; no. 22; pp. 1565 - 1568
Main Authors: Kevan, S D, Rosenblatt, D H, Denley, D, Lu, B-C, Shirley, D A
Format: Journal Article
Language:English
Published: 27-11-1978
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:Modulations of up to a factor of two were observed in the Se 3d photoelectron intensity normal to the surface, for Se overlayers on Ni(100), as the photon energy was varied from 90 to 240 eV. Excellent agreement of energies with predictions by Tong and Li was obtained for both the c(2 2) and p(2 x 2) structures, using the hollow-site geometry. Normal photoelectron diffraction appears to have promise as a surface structural method.18 refs.--AA
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:0031-9007
DOI:10.1103/PhysRevLett.41.1565