Stability of the Y2O3–SiO2 system in high‐temperature, high‐velocity water vapor

Stability of the Y2O3–SiO2 system in high‐temperature, high‐velocity water vapor

High‐temperature, high‐velocity water vapor (steam‐jet) exposures were conducted on Y2O3, Y2SiO5, Y2Si2O7, and SiO2 for 60 hours at 1400°C. Volatility of Y2O3 was not observed. Phase‐pure Y2SiO5 exhibited SiO2 loss forming Y2O3 and porosity. A mixed porous and dense Y2SiO5 layer formed on the surfac...

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Bibliographic Details
Published in:Journal of the American Ceramic Society Vol. 103; no. 4; pp. 2715 - 2726
Main Authors: Parker, Cory G., Opila, Elizabeth J.
Format: Journal Article
Language:English
Published: Columbus Wiley Subscription Services, Inc 01-04-2020
Subjects:
Depletion
EBC
Porosity
Reaction kinetics
Silicon dioxide
Steam jets
steam volatility
Volatility
Water vapor
Yttrium oxide
yttrium silicates
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Summary:High‐temperature, high‐velocity water vapor (steam‐jet) exposures were conducted on Y2O3, Y2SiO5, Y2Si2O7, and SiO2 for 60 hours at 1400°C. Volatility of Y2O3 was not observed. Phase‐pure Y2SiO5 exhibited SiO2 loss forming Y2O3 and porosity. A mixed porous and dense Y2SiO5 layer formed on the surface of Y2Si2O7 due to SiO2 depletion. The mechanisms and kinetics of the reaction between SiO2 and H2O(g) to form Si(OH)4(g) from Y2SiO5, Y2Si2O7, and SiO2 are discussed.
ISSN:0002-7820
1551-2916
DOI:10.1111/jace.16915