300-keV High-power ion-beam source: Practical applications

300-keV High-power ion-beam source: Practical applications

A 300-keV high-power ion-beam source has been evaluated. The results obtained are reported. An extra high-voltage pulse was applied to the anode to produce plasma of a certain species content. In particular, accelerator beam was used to prepare 0.01-1 m-thick metallic films.

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Bibliographic Details
Published in:1990 8th International Conference on High-Power Particle Beams pp. 1243 - 1248
Main Authors: Goncharov, O. I., Isakov, I. F., Kolodii, V. N., Matvienko, V. M., Opekunov, M. S., Remnev, G. E., Usov, Y. P., Zakutayev, A. N.
Format: Conference Proceeding
Language:English
Published: IEEE 01-07-1990
Subjects:
Ion beams
Plasmas
Rough surfaces
Semiconductor diodes
Online Access:Get full text
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Description
Summary:A 300-keV high-power ion-beam source has been evaluated. The results obtained are reported. An extra high-voltage pulse was applied to the anode to produce plasma of a certain species content. In particular, accelerator beam was used to prepare 0.01-1 m-thick metallic films.
ISBN:9789810205454
9810205457