Extraction of mobility degradation, effective channel length and total series resistance of NMOS at elevated temperature

• Published in: The 8th Electrical Engineering/ Electronics, Computer, Telecommunications and Information Technology (ECTI) Association of Thailand - Conference 2011 pp. 2 - 5
• Main Authors: Kiddee, Kunagone, Ruangphanit, Anucha, Niemcharoen, Surasak, Atiwongsangthong, Narin, Muanghlua, Rangson
• Format: Conference Proceeding
• Language: English
• Published: IEEE 01-05-2011
• Subjects: Channel length; Electrical resistance measurement; Mobility; MOS devices; NMOS; Resistance
• ISBN: 1457704250; 9781457704253
• DOI: 10.1109/ECTICON.2011.5947755

This article describes the extraction of total series resistance, effective channel length and low field effective channel mobility degradation parameter at temperature in the range of 25°C-125 °C of NMOS device .The relation of I DS and V GS in a linear region was used with a different of channel length. The procedure is based on the measurement of the transconductance characteristics of MOSFET in the linear region. The transconductance characteristics is determine for the several devices of difference drawn channel length. The results shows that, the effective channel length is increased in a range of 5×10 -10 m/°C. The low field mobility degradation parameter is decreased by the factor of 0.733. The total series resistance is increased in the range of 1.4 Ω-μm/°C. The errors between the predicted model and measured of I DS &V GS in linear region is approximately 3 %.