Microspherical lithography for selective epitaxy

Microspherical lithography for selective epitaxy

The effect of focusing with microspheric lenses during the photolithography process is recently studied intensively due to the wide range of applications of this method. This paper presents the results of nanostructuring the silicon surface using photolithography on the hexagonal array of microspher...

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Bibliographic Details
Published in:2022 International Conference Laser Optics (ICLO) p. 1
Main Authors: Dvoretckaia, L.N., Mozharov, A.M., Gavrilov, M.S., Fedorov, V.V.
Format: Conference Proceeding
Language:English
Published: IEEE 20-06-2022
Subjects:
Epitaxial growth
Etching
Focusing
GaP
InAs
Lithography
MBE
microspherical lithography
Optics
selective epitaxy
Semiconductor nanostructures
Silicon
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Summary:The effect of focusing with microspheric lenses during the photolithography process is recently studied intensively due to the wide range of applications of this method. This paper presents the results of nanostructuring the silicon surface using photolithography on the hexagonal array of microspheric lenses and etching silicon in nanoholes. The possibility of epitaxial selective synthesis of semiconductor nanostructures A3B5 on silicon is demonstrated.
ISBN:1665466634
9781665466639
ISSN:2642-5580
DOI:10.1109/ICLO54117.2022.9840191