Multi-wavelength Reflectivity Monitoring on Growth of AlN on Si

Analysis of oscillation of reflectivity on thin film growth at a wavelength the film is transparent results in more than one solution of growth rate sometimes. Usually, the correct growth rate is chosen among the solutions with knowledge of refractive index of the film. On the other hand, if the ref...

Full description

Saved in:
Bibliographic Details
Published in:2019 Compound Semiconductor Week (CSW) pp. 1 - 2
Main Authors: Iyechika, Yasushi, Tsukui, Masayuki, Miyano, Kiyotaka, Takahashi, Hideshi
Format: Conference Proceeding
Language:English
Published: IEEE 01-05-2019
Subjects:
Online Access:Get full text
Tags: Add Tag
No Tags, Be the first to tag this record!
Abstract Analysis of oscillation of reflectivity on thin film growth at a wavelength the film is transparent results in more than one solution of growth rate sometimes. Usually, the correct growth rate is chosen among the solutions with knowledge of refractive index of the film. On the other hand, if the reflectivity is monitored at two or more wavelengths, the correct solution is chosen by comparing the solutions at different wavelengths. In this report, an example of AlN growth on Si substrate is shown.
AbstractList Analysis of oscillation of reflectivity on thin film growth at a wavelength the film is transparent results in more than one solution of growth rate sometimes. Usually, the correct growth rate is chosen among the solutions with knowledge of refractive index of the film. On the other hand, if the reflectivity is monitored at two or more wavelengths, the correct solution is chosen by comparing the solutions at different wavelengths. In this report, an example of AlN growth on Si substrate is shown.
Author Tsukui, Masayuki
Takahashi, Hideshi
Miyano, Kiyotaka
Iyechika, Yasushi
Author_xml – sequence: 1
  givenname: Yasushi
  surname: Iyechika
  fullname: Iyechika, Yasushi
  organization: NuFlare Technology, Inc., 8-1 Shinsugita, Isogo, Yokahama, Japan
– sequence: 2
  givenname: Masayuki
  surname: Tsukui
  fullname: Tsukui, Masayuki
  organization: NuFlare Technology, Inc., 8-1 Shinsugita, Isogo, Yokahama, Japan
– sequence: 3
  givenname: Kiyotaka
  surname: Miyano
  fullname: Miyano, Kiyotaka
  organization: NuFlare Technology, Inc., 8-1 Shinsugita, Isogo, Yokahama, Japan
– sequence: 4
  givenname: Hideshi
  surname: Takahashi
  fullname: Takahashi, Hideshi
  organization: NuFlare Technology, Inc., 8-1 Shinsugita, Isogo, Yokahama, Japan
BookMark eNotj81KAzEUhSPoQmufoJt5gRlvksnPXUkZtA50tLS6LjGT1MCYyBhb-vZW7OrA4eN8nBtyGVN0hMwoVJQC3rVNu1p3FQOKldYUORMXZIpKU8U0BdCgrsl99zPkUB7M3g0u7vJHsXZ-cDaHfcjHoksx5DSGuCtSLBZjOpyI5Iv58PxXbMItufJm-HbTc07I2-PDa_NULl8WbTNfloEqkUteQ-8pe_cnK5e6dl4jWCbRCyMV9hYEBVn3SqBUvYDaSLQ9UxZrro1FPiGz_93gnNt-jeHTjMft-Rb_BeBjRa4
ContentType Conference Proceeding
DBID 6IE
6IH
CBEJK
RIE
RIO
DOI 10.1109/ICIPRM.2019.8819325
DatabaseName IEEE Electronic Library (IEL) Conference Proceedings
IEEE Proceedings Order Plan (POP) 1998-present by volume
IEEE Xplore All Conference Proceedings
IEEE Electronic Library Online
IEEE Proceedings Order Plans (POP) 1998-present
DatabaseTitleList
Database_xml – sequence: 1
  dbid: RIE
  name: IEEE Electronic Library Online
  url: http://ieeexplore.ieee.org/Xplore/DynWel.jsp
  sourceTypes: Publisher
DeliveryMethod fulltext_linktorsrc
EISBN 9781728100807
1728100801
EndPage 2
ExternalDocumentID 8819325
Genre orig-research
GroupedDBID 6IE
6IH
CBEJK
RIE
RIO
ID FETCH-LOGICAL-i175t-340df12bf0803684ef890c269f5a679dc051064d75967d504a69cd27c9438ac93
IEDL.DBID RIE
IngestDate Thu Jun 29 18:38:26 EDT 2023
IsPeerReviewed false
IsScholarly false
Language English
LinkModel DirectLink
MergedId FETCHMERGED-LOGICAL-i175t-340df12bf0803684ef890c269f5a679dc051064d75967d504a69cd27c9438ac93
PageCount 2
ParticipantIDs ieee_primary_8819325
PublicationCentury 2000
PublicationDate 2019-May
PublicationDateYYYYMMDD 2019-05-01
PublicationDate_xml – month: 05
  year: 2019
  text: 2019-May
PublicationDecade 2010
PublicationTitle 2019 Compound Semiconductor Week (CSW)
PublicationTitleAbbrev ICIPRM
PublicationYear 2019
Publisher IEEE
Publisher_xml – name: IEEE
Score 1.7332692
Snippet Analysis of oscillation of reflectivity on thin film growth at a wavelength the film is transparent results in more than one solution of growth rate sometimes....
SourceID ieee
SourceType Publisher
StartPage 1
SubjectTerms AlN on Si
multi-wavelength
reflectivity monitoring
Title Multi-wavelength Reflectivity Monitoring on Growth of AlN on Si
URI https://ieeexplore.ieee.org/document/8819325
hasFullText 1
inHoldings 1
isFullTextHit
isPrint
link http://sdu.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwlV1LSwMxEA5uT55UWvFNDh5dm2azeZxEamt7sJRWwVvJJhMtlN2iLf59k-xSEbx4C0MgTIbJPDLfDELXoKm3ctalROgiZdoHKAXlXiBGAdVECmlDTnc0F5NX-TAIbXJudlgYAIjFZ3AblvEv31ZmG1JlXSmDu5EnKBFK1litppFQj6juuD-ezp5CtVYQf9z5a2RKtBjDg_-ddYg6P9A7PN0ZlSO0B2Ub3UWYbPqlw5SI8m3zjmfgVvGp8k40rvUyJOhwVeJHH1j7HZXD96tJIMyXHfQyHDz3R2kz-SBdenO-STNGrOvRwnl_LuOSgZOKGMqVyzUXypqgSpxZkSsubE6Y5spYKoximdRGZceoVVYlnCBsgHspWZCaFCynrCi8ohnwgZJhTlF9itqB-cW6bm6xaPg--5t8jvbD_dYVfxeotfnYwiVKPu32KorjG_5CjSI
link.rule.ids 310,311,782,786,791,792,798,27934,54767
linkProvider IEEE
linkToHtml http://sdu.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwlR3LTgIxcCJ40JMaML7twaMrS7fbx8kYBCECIYCJN9LtA0nIrlGIv2_bJRgTL96aySTNdDqdR-cBcGMkdlpO2yhmMouIdA5KhqljiBIGy5gzrn1Mtzthw1f-2PZtcm63tTDGmJB8Zu78Mvzl60Ktfaiswbk3N9IK7KaEUVZWa21aCTVj0ei1eqPxwOdr-QsQcH8NTQk6o3Pwv90Oof5TfIdGW7VyBDsmr8F9KJSNvqSfE5HPV29obOwyPFbOjEalZPoQHSpy9ORca4dRWPSwHHrAZFGHl0572upGm9kH0cIp9FWUkFjbJs6ss-gSyomxXMQKU2FTSZnQygsTJZqlgjKdxkRSoTRmSpCESyWSY6jmRW5OAClDHZ-04TLOSIpJljlRU8a5SopYgeUp1Dzxs_eyvcVsQ_fZ3-Br2OtOB_1Zvzd8Pod9f9Zl_t8FVFcfa3MJlU-9vgqs-QaeYZBz
openUrl ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Abook&rft.genre=proceeding&rft.title=2019+Compound+Semiconductor+Week+%28CSW%29&rft.atitle=Multi-wavelength+Reflectivity+Monitoring+on+Growth+of+AlN+on+Si&rft.au=Iyechika%2C+Yasushi&rft.au=Tsukui%2C+Masayuki&rft.au=Miyano%2C+Kiyotaka&rft.au=Takahashi%2C+Hideshi&rft.date=2019-05-01&rft.pub=IEEE&rft.spage=1&rft.epage=2&rft_id=info:doi/10.1109%2FICIPRM.2019.8819325&rft.externalDocID=8819325