On the influence of temperature gradient of annealing process on the nano-structure and sensing properties of WO 3 thin films to NO 2 gas and relative humidity

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Bibliographic Details
Published in:Materials science in semiconductor processing Vol. 41; pp. 177 - 183
Main Authors: Khojier, K., Savaloni, H., Habashi, N., Sadi, M.H.
Format: Journal Article
Language:English
Published: 01-01-2016
Online Access:Get full text
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Description
ISSN:1369-8001
DOI:10.1016/j.mssp.2015.08.036