On the influence of temperature gradient of annealing process on the nano-structure and sensing properties of WO 3 thin films to NO 2 gas and relative humidity
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Published in: | Materials science in semiconductor processing Vol. 41; pp. 177 - 183 |
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Main Authors: | , , , |
Format: | Journal Article |
Language: | English |
Published: |
01-01-2016
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Online Access: | Get full text |
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ISSN: | 1369-8001 |
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DOI: | 10.1016/j.mssp.2015.08.036 |