Surface Deposition Induced Reduction of the Ground State Spin in Cr 10 Wheel
We report the deposition of monolayers and multilayers of {Cr 10 (OMe) 20 (O 2 CCMe 3 ) 10 } wheels, hereafter {Cr 10 }, onto Au(111) and Cu(111) single‐crystal substrates, and their characterization combining scanning tunneling microscopy, X‐ray photoelectron spectroscopy, X‐ray absorption spectros...
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Published in: | Advanced materials interfaces Vol. 10; no. 20 |
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Main Authors: | , , , , , , , , , , , , , |
Format: | Journal Article |
Language: | English |
Published: |
01-07-2023
|
Online Access: | Get full text |
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Summary: | We report the deposition of monolayers and multilayers of {Cr
10
(OMe)
20
(O
2
CCMe
3
)
10
} wheels, hereafter {Cr
10
}, onto Au(111) and Cu(111) single‐crystal substrates, and their characterization combining scanning tunneling microscopy, X‐ray photoelectron spectroscopy, X‐ray absorption spectroscopy, X‐ray natural linear dichroism, and X‐ray magnetic circular dichroism (XMCD). {Cr
10
} in bulk shows axial magnetic anisotropy and a cluster total spin
S
= 9 ground state, stemming from an interaction scheme of two semi‐crowns containing four Cr
3+
ions interacting ferromagnetically, separated by two Cr
3+
antiferromagnetically coupled. The one‐monolayer (1ML) samples of {Cr
10
} sublimated on Ag(111) and Cu(111) show slightly different applied magnetic field dependence of XMCD signal. The field‐dependence of the magnetization evolves from a lower curve for the 1ML {Cr
10
} samples to a curve resembling the bulk one as the number of layers is increased, as shown in a 14ML sample. Monte Carlo simulations allow rationalizing the magnetization curves of the 1ML samples in terms of a reduction of the cluster ground‐state total spin,
S
= 3 or
S
= 6, as a consequence of variations in the intra‐wheel coupling interactions induced by the on‐surface deposition. The sensitivity of the magnetic configuration of {Cr
10
} to minor distortions of the intramolecular conformation might be exploited to control magnetism by external stimuli for applications. |
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ISSN: | 2196-7350 2196-7350 |
DOI: | 10.1002/admi.202300146 |