On the microstructure, chemistry, and dielectric function of BaTiO 3 MOCVD thin films

• Published in: Journal of materials research Vol. 9; no. 2; pp. 426 - 430
• Main Authors: Dravid, V.P., Zhang, H., Wills, L.A., Wessels, B.W.
• Format: Journal Article
• Language: English
• Published: 01-02-1994
• ISSN: 0884-2914; 2044-5326
• DOI: 10.1557/JMR.1994.0426

Thin films of BaTiO
3
deposited on (100)LaAlO
3
substrate by metal-organic chemical vapor deposition (MOCVD) are investigated using several electron-optical techniques. Combined high resolution transmission electron microscopy (HRTEM), electron energy loss spectrometry (EELS), and convergent beam electron diffraction (CBED) indicate a substantial influence of lattice strain on the structural and optical characteristics of BaTiO
3
films. Spatially resolved EELS and CBED studies indicate that the substrate influence persists up to about 40 nm away from the interface. The changes in the dielectric function of the films, as inferred from spatially resolved EELS, appear to correlate well with internal lattice strain in the films as deduced from convergent beam electron diffraction (CBED).