Chemical warfare agent decontamination studies in the plasma decon chamber
A "plasma decon chamber" has been developed at Los Alamos National Laboratory (LANL), Albuquerque, NM, to study the decontamination of chemical and biological warfare agents. This technology is targeted at sensitive electronic equipment for which there is currently no acceptable, nondestru...
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Published in: | IEEE transactions on plasma science Vol. 30; no. 4; pp. 1460 - 1470 |
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Main Authors: | , , , , , |
Format: | Journal Article |
Language: | English |
Published: |
New York
IEEE
01-08-2002
The Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
Subjects: | |
Online Access: | Get full text |
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Summary: | A "plasma decon chamber" has been developed at Los Alamos National Laboratory (LANL), Albuquerque, NM, to study the decontamination of chemical and biological warfare agents. This technology is targeted at sensitive electronic equipment for which there is currently no acceptable, nondestructive means of decontamination. Chemical reactivity is provided by a downstream flux of reactive radicals such as atomic oxygen and atomic hydrogen, produced in a capacitively coupled plasma. In addition, the decon chamber provides an environment that accelerates the evaporation of chemical agents from contaminated surfaces by vacuum, heat, and forced convection. Once evaporated, agents and agent byproducts are recirculated directly through the plasma, where they undergo further chemical breakdown. Preliminary studies on actual chemical agents were conducted at the U.S. Army Dugway Proving Ground, Dugway, UT. Exposures were conducted at a system pressure of 30 torr, exposure temperature of 70/spl deg/C, plasma-to-sample standoff distance of 10 cm, and 10% addition of oxygen or hydrogen to a helium balance. This exposure condition was based on optimization studies conducted at LANL on agent simulants. The agents studied were VX and soman (GD) nerve agents and sulfur mustard (HD) blister agent, as well as a thickened simulant. All agents were decontaminated off aluminum substrates to below the detection limit of /spl sim/0.1% of the initial contamination level of approximately 1 mg/cm/sup 2/. For VX, this level of decontamination was achieved in 8-16 min of exposure, while only 2 min were required for the more volatile HD and GD. Evaporation and subsequent gas-phase chemical breakdown in the plasma appears to be the dominant decontamination mechanism for all of the agents. However, an observed difference in the decontamination process between oxygen and hydrogen indicates that chemical reactivity in the liquid phase also plays an important role. |
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Bibliography: | ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23 |
ISSN: | 0093-3813 1939-9375 |
DOI: | 10.1109/TPS.2002.804196 |