Structure, composition, and mechanical characterization of dc sputtered TiN-MoS2 nanocomposite thin films

TiN-MoS2 composite thin films deposited by dc magnetron sputtering with MoS2 concentrations from 3 to 40at.% were investigated. The elementary composition and the formed compounds were determined before and after wear. The crystalline structure of the composite thin films was accessed and the nature...

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Published in:	Surface & coatings technology Vol. 205; no. 13-14; pp. 3810 - 3815
Main Authors:	Strapasson, G., Badin, P.C., Soares, G.V., Machado, G., Figueroa, C.A., Hubler, R., Gasparin, A.L., Baumvol, I.J.R., Aguzzoli, C., Tentardini, E.K.
Format:	Journal Article
Language:	English
Published:	Amsterdam Elsevier B.V 25-03-2011 Elsevier
Subjects:	Applied sciences Composite coatings Concentration (composition) Cross-disciplinary physics: materials science; rheology Direct current Elastic strain to failure Exact sciences and technology Failure Materials science Mechanical properties and methods of testing. Rheology. Fracture mechanics. Tribology Metals. Metallurgy Methods of deposition of films and coatings; film growth and epitaxy Molybdenum disulfide Nanocomposites Nanohardness Nanomaterials Nanoscopic clusters Nanostructure Physics Production techniques Surface treatment Surface treatments Thin films TiN-MoS2 Titanium nitride Thin films Nanohardness Nanostructure Elastic strain to failure TiN-MoS2 Nanoscopic clusters TiN-MoS Molybdenum sulfide Titanium nitride Mechanical properties Cluster Surface treatments Nanostructures Sputtering Composite materials Nanocomposites
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Abstract	TiN-MoS2 composite thin films deposited by dc magnetron sputtering with MoS2 concentrations from 3 to 40at.% were investigated. The elementary composition and the formed compounds were determined before and after wear. The crystalline structure of the composite thin films was accessed and the nature and concentration of the precipitates in the TiN matrix were imaged by transmission electron microscopy. The hardness and elastic moduli of the films were measured by nanoindentation and the elastic strain to failure calculated on the basis of these two magnitudes. The MoS2 formed in the composite coatings during thin film co-deposition are nanoscopic in size, homogeneously distributed, and mostly amorphous, although part of them are crystalline. The present study does not confirm MoS2 formation at grain boundaries or TiS formation by substitution of S for N in the TiN matrix. The hardness and elastic strain to failure are appreciably high for the present TiN-MoS2 thin film composite coatings with MoS2 concentrations up to 4%. The potential applications are discussed on the basis of these findings. ► MoS2 clusters are formed in the TiN matrix during sputtering co-deposition process. ► MoS2 clusters are nanoscopic in size, homogeneously distributed and mostly amorphous. ► Coatings with low MoS2 concentration have potential for wear resistance applications. ► The study does not confirm MoS2 formation at grain boundaries. ► Neither TiS formation by substitution of S for N in the TiN matrix.
AbstractList	TiN-MoS2 composite thin films deposited by dc magnetron sputtering, with MoS2 concentrations from 3 to 40 at%, were investigated. The elementary composition and the formed compounds were determined before and after wear. The crystalline structure of the composite thin films was assessed and the nature and concentration of the precipitates in the TiN matrix were observed by TEM. The hardness and elastic moduli of the films were measured by nanoindentation and the elastic strain to failure was calculated. The MoS2 formed in the composite coatings during thin film co-deposition was nanosized, homogeneously distributed, and mostly amorphous, although some was crystalline. This study does not confirm MoS2 formation at the grain boundaries or TiS formation by substitution of S for N in the TiN matrix. The hardness and elastic strain to failure were higher for the TiN-MoS2 thin film composite coatings with MoS2 concentrations up to 4%. The potential applications are discussed on the basis of these findings. TiN-MoS2 composite thin films deposited by dc magnetron sputtering with MoS2 concentrations from 3 to 40at.% were investigated. The elementary composition and the formed compounds were determined before and after wear. The crystalline structure of the composite thin films was accessed and the nature and concentration of the precipitates in the TiN matrix were imaged by transmission electron microscopy. The hardness and elastic moduli of the films were measured by nanoindentation and the elastic strain to failure calculated on the basis of these two magnitudes. The MoS2 formed in the composite coatings during thin film co-deposition are nanoscopic in size, homogeneously distributed, and mostly amorphous, although part of them are crystalline. The present study does not confirm MoS2 formation at grain boundaries or TiS formation by substitution of S for N in the TiN matrix. The hardness and elastic strain to failure are appreciably high for the present TiN-MoS2 thin film composite coatings with MoS2 concentrations up to 4%. The potential applications are discussed on the basis of these findings. a-[ordm MoS2 clusters are formed in the TiN matrix during sputtering co-deposition process. a-[ordm MoS2 clusters are nanoscopic in size, homogeneously distributed and mostly amorphous. a-[ordm Coatings with low MoS2 concentration have potential for wear resistance applications. a-[ordm The study does not confirm MoS2 formation at grain boundaries. a-[ordm Neither TiS formation by substitution of S for N in the TiN matrix. TiN-MoS2 composite thin films deposited by dc magnetron sputtering with MoS2 concentrations from 3 to 40at.% were investigated. The elementary composition and the formed compounds were determined before and after wear. The crystalline structure of the composite thin films was accessed and the nature and concentration of the precipitates in the TiN matrix were imaged by transmission electron microscopy. The hardness and elastic moduli of the films were measured by nanoindentation and the elastic strain to failure calculated on the basis of these two magnitudes. The MoS2 formed in the composite coatings during thin film co-deposition are nanoscopic in size, homogeneously distributed, and mostly amorphous, although part of them are crystalline. The present study does not confirm MoS2 formation at grain boundaries or TiS formation by substitution of S for N in the TiN matrix. The hardness and elastic strain to failure are appreciably high for the present TiN-MoS2 thin film composite coatings with MoS2 concentrations up to 4%. The potential applications are discussed on the basis of these findings. ► MoS2 clusters are formed in the TiN matrix during sputtering co-deposition process. ► MoS2 clusters are nanoscopic in size, homogeneously distributed and mostly amorphous. ► Coatings with low MoS2 concentration have potential for wear resistance applications. ► The study does not confirm MoS2 formation at grain boundaries. ► Neither TiS formation by substitution of S for N in the TiN matrix.
Author	Gasparin, A.L. Strapasson, G. Tentardini, E.K. Hubler, R. Soares, G.V. Figueroa, C.A. Aguzzoli, C. Badin, P.C. Baumvol, I.J.R. Machado, G.
Author_xml	– sequence: 1 givenname: G. surname: Strapasson fullname: Strapasson, G. organization: Universidade de Caxias do Sul, Caxias do Sul, 95070-560, Brazil – sequence: 2 givenname: P.C. surname: Badin fullname: Badin, P.C. organization: Universidade de Caxias do Sul, Caxias do Sul, 95070-560, Brazil – sequence: 3 givenname: G.V. surname: Soares fullname: Soares, G.V. organization: Instituto de Física, UFRGS, Porto Alegre, 91509-900, Brazil – sequence: 4 givenname: G. surname: Machado fullname: Machado, G. organization: Centro de Tecnologia Estratégicas do Nordeste, Recife, Brazil – sequence: 5 givenname: C.A. surname: Figueroa fullname: Figueroa, C.A. organization: Universidade de Caxias do Sul, Caxias do Sul, 95070-560, Brazil – sequence: 6 givenname: R. surname: Hubler fullname: Hubler, R. organization: Pontifícia Universidade Católica do Rio Grande do Sul — GEPSI, 90619-900, RS, Brazil – sequence: 7 givenname: A.L. surname: Gasparin fullname: Gasparin, A.L. organization: Universidade de Caxias do Sul, Caxias do Sul, 95070-560, Brazil – sequence: 8 givenname: I.J.R. surname: Baumvol fullname: Baumvol, I.J.R. organization: Universidade de Caxias do Sul, Caxias do Sul, 95070-560, Brazil – sequence: 9 givenname: C. surname: Aguzzoli fullname: Aguzzoli, C. organization: Universidade de Caxias do Sul, Caxias do Sul, 95070-560, Brazil – sequence: 10 givenname: E.K. surname: Tentardini fullname: Tentardini, E.K. email: etentardini@gmail.com organization: Universidade Federal do Sergipe, Aracaju, Brazil
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Keywords	Thin films Nanohardness Nanostructure Elastic strain to failure TiN-MoS2 Nanoscopic clusters TiN-MoS Molybdenum sulfide Titanium nitride Mechanical properties Cluster Surface treatments Nanostructures Sputtering Composite materials Nanocomposites
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Snippet	TiN-MoS2 composite thin films deposited by dc magnetron sputtering with MoS2 concentrations from 3 to 40at.% were investigated. The elementary composition and... TiN-MoS2 composite thin films deposited by dc magnetron sputtering, with MoS2 concentrations from 3 to 40 at%, were investigated. The elementary composition...
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SubjectTerms	Applied sciences Composite coatings Concentration (composition) Cross-disciplinary physics: materials science; rheology Direct current Elastic strain to failure Exact sciences and technology Failure Materials science Mechanical properties and methods of testing. Rheology. Fracture mechanics. Tribology Metals. Metallurgy Methods of deposition of films and coatings; film growth and epitaxy Molybdenum disulfide Nanocomposites Nanohardness Nanomaterials Nanoscopic clusters Nanostructure Physics Production techniques Surface treatment Surface treatments Thin films TiN-MoS2 Titanium nitride
Title	Structure, composition, and mechanical characterization of dc sputtered TiN-MoS2 nanocomposite thin films
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