Intramolecularly Coordinated Gallium Sulfides: Suitable Single Source Precursors for GaS Thin Films

Our studies have been focused on the synthesis of N→Ga coordinated organogallium sulfides [L1Ga(μ‐S)]3 (1) and [L2Ga(μ‐S)]2 (2) containing either N,C,N‐ or C,N‐chelating ligands L1 or L2 (L1 is {2,6‐(Me2NCH2)2C6H3}− and L2 is {2‐(Et2NCH2)‐4,6‐tBu2‐C6H2}−). As the result of the different ligands, com...

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Published in:Chemistry : a European journal Vol. 22; no. 52; pp. 18817 - 18823
Main Authors: Řičica, Tomáš, Světlík, Tomáš, Dostál, Libor, Růžička, Aleš, Růžička, Květoslav, Beneš, Ludvík, Němec, Petr, Bouška, Marek, Jambor, Roman
Format: Journal Article
Language:English
Published: Germany Blackwell Publishing Ltd 23-12-2016
Wiley Subscription Services, Inc
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Summary:Our studies have been focused on the synthesis of N→Ga coordinated organogallium sulfides [L1Ga(μ‐S)]3 (1) and [L2Ga(μ‐S)]2 (2) containing either N,C,N‐ or C,N‐chelating ligands L1 or L2 (L1 is {2,6‐(Me2NCH2)2C6H3}− and L2 is {2‐(Et2NCH2)‐4,6‐tBu2‐C6H2}−). As the result of the different ligands, compounds 1 and 2 differ mutually in their structure. To change the Ga/S ratio, unusually N→Ga coordinated organogallium tetrasulfide L1Ga(κ2‐S4) (3) was prepared and the unprecedented complex [{2‐[CH{(CH2)3CH3}(μ‐OH)]‐6‐CH2NMe2}C6H3]GaS (4) was also isolated as the minor by‐product of the reaction. Compounds 1–3 were further studied as potential single‐source precursors for amorphous GaS thin film deposition by spin‐coating. N→Ga coordinated organogallium sulfides containing either N,C,N‐ or C,N‐chelating ligands were prepared. As a result of the different ligands, the compounds differ in their structure. To change the Ga/S ratio, an unusually N→Ga coordinated organogallium tetrasulfide was prepared. All compounds were studied as potential single‐source precursors for GaS thin film deposition by spin‐coating and the obtained values fall into the regions reported for the GaS materials prepared by different techniques.
Bibliography:ArticleID:CHEM201604190
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content type line 23
ISSN:0947-6539
1521-3765
DOI:10.1002/chem.201604190