UV‐Responsive Behavior of Azopyridine‐Containing Diblock Copolymeric Vesicles: Photoinduced Fusion, Disintegration and Rearrangement

A novel amphiphilic diblock copolymer composed of a hydrophilic poly(ethylene oxide) and a hydrophobic polymethacrylate with photochromic azopyridine moieties in the side groups was synthesized by atom transfer radical polymerization. The copolymeric vesicles showed photoinduced circular process inc...

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Bibliographic Details
Published in:Macromolecular rapid communications. Vol. 30; no. 13; pp. 1089 - 1093
Main Authors: Lin, Li, Yan, Zeng, Gu, Junsi, Zhang, Yuanyuan, Feng, Ze, Yu, Yanlei
Format: Journal Article
Language:English
Published: Weinheim WILEY‐VCH Verlag 01-07-2009
Wiley
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Summary:A novel amphiphilic diblock copolymer composed of a hydrophilic poly(ethylene oxide) and a hydrophobic polymethacrylate with photochromic azopyridine moieties in the side groups was synthesized by atom transfer radical polymerization. The copolymeric vesicles showed photoinduced circular process including fusion, damage and defect formation, disruption, disintegration and rearrangement in H2O/THF during the irradiation of UV light. The process of photoresponsive cycle can be inhibited at any moment by visible light. Vesicles self‐assembled from an azopyridine‐containing amphiphilic diblock copolymer possess circular photoresponsive behavior including fusion, disintegration and rearrangement. The extent of photoinduced change can be determined by the irradiation of UV and visible light. It is possible to realize controlled release of the encapsulated substance only depending on light stimuli.
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ISSN:1022-1336
1521-3927
DOI:10.1002/marc.200900105