Self-sputtering far above the runaway threshold: an extraordinary metal-ion generator
When self-sputtering is driven far above the runaway threshold voltage, energetic electrons are made available to produce "excess plasma" far from the magnetron target. Ionization balance considerations show that the secondary electrons deliver the necessary energy to the "remote"...
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Published in: | Physical review letters Vol. 102; no. 4; p. 045003 |
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30-01-2009
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Abstract | When self-sputtering is driven far above the runaway threshold voltage, energetic electrons are made available to produce "excess plasma" far from the magnetron target. Ionization balance considerations show that the secondary electrons deliver the necessary energy to the "remote" zone. Thereby, such a system can be an extraordinarily prolific generator of usable metal ions. Contrary to other known sources, the ion current to a substrate can exceed the discharge current. For gasless self-sputtering of copper, the usable ion current scales exponentially with the discharge voltage. |
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AbstractList | When self-sputtering is driven far above the runaway threshold voltage, energetic electrons are made available to produce "excess plasma" far from the magnetron target. Ionization balance considerations show that the secondary electrons deliver the necessary energy to the "remote" zone. Thereby, such a system can be an extraordinarily prolific generator of usable metal ions. Contrary to other known sources, the ion current to a substrate can exceed the discharge current. For gasless self-sputtering of copper, the usable ion current scales exponentially with the discharge voltage. |
ArticleNumber | 045003 |
Author | Andersson, Joakim Anders, André |
Author_xml | – sequence: 1 givenname: Joakim surname: Andersson fullname: Andersson, Joakim organization: Lawrence Berkeley National Laboratory, Berkeley, California 94720, USA – sequence: 2 givenname: André surname: Anders fullname: Anders, André |
BackLink | https://www.ncbi.nlm.nih.gov/pubmed/19257430$$D View this record in MEDLINE/PubMed https://www.osti.gov/biblio/21180160$$D View this record in Osti.gov |
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Cites_doi | 10.1007/978-0-387-79108-1 10.1007/978-3-642-65886-0 10.1116/1.582380 10.1116/1.569107 10.1116/1.1865133 10.1016/S0257-8972(99)00292-3 10.1016/j.tsf.2006.03.033 10.1063/1.2936307 10.1116/1.578679 10.1016/0042-207X(96)80013-3 10.1209/0295-5075/77/45002 10.1063/1.373519 10.1063/1.2875523 10.1016/j.tsf.2006.04.051 10.1063/1.2938414 10.1007/978-3-642-61247-3 10.1063/1.2817812 10.1116/1.2388954 10.1088/0022-3727/24/4/001 |
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References | PhysRevLett.102.045003Cc4R1 PhysRevLett.102.045003Cc5R1 D. Bohm (PhysRevLett.102.045003Cc13R1) 1949 PhysRevLett.102.045003Cc15R1 A. Anders (PhysRevLett.102.045003Cc1R1) 2008 PhysRevLett.102.045003Cc2R1 PhysRevLett.102.045003Cc18R1 PhysRevLett.102.045003Cc3R1 PhysRevLett.102.045003Cc8R1 PhysRevLett.102.045003Cc12R1 PhysRevLett.102.045003Cc9R1 PhysRevLett.102.045003Cc11R1 PhysRevLett.102.045003Cc6R1 PhysRevLett.102.045003Cc22R1 PhysRevLett.102.045003Cc23R1 N. Hosokawa (PhysRevLett.102.045003Cc7R1) 1980 Y. P. Raizer (PhysRevLett.102.045003Cc17R1) 1991 PhysRevLett.102.045003Cc19R1 P. M. Chung (PhysRevLett.102.045003Cc14R1) 1975 J. A. Hopwood (PhysRevLett.102.045003Cc20R1) 2000 PhysRevLett.102.045003Cc21R1 PhysRevLett.102.045003Cc10R1 L. M. Biberman (PhysRevLett.102.045003Cc16R1) 1982 |
References_xml | – volume-title: Cathodic Arcs: From Fractal Spots to Energetic Condensation year: 2008 ident: PhysRevLett.102.045003Cc1R1 doi: 10.1007/978-0-387-79108-1 contributor: fullname: A. Anders – volume-title: The Characteristics of Electrical Discharges in Magnetic Fields year: 1949 ident: PhysRevLett.102.045003Cc13R1 contributor: fullname: D. Bohm – volume-title: Electric Probes in Stationary and Flowing Plasmas: Theory and Applications year: 1975 ident: PhysRevLett.102.045003Cc14R1 doi: 10.1007/978-3-642-65886-0 contributor: fullname: P. M. Chung – ident: PhysRevLett.102.045003Cc3R1 doi: 10.1116/1.582380 – ident: PhysRevLett.102.045003Cc6R1 doi: 10.1116/1.569107 – ident: PhysRevLett.102.045003Cc18R1 doi: 10.1116/1.1865133 – ident: PhysRevLett.102.045003Cc2R1 doi: 10.1016/S0257-8972(99)00292-3 – ident: PhysRevLett.102.045003Cc4R1 doi: 10.1016/j.tsf.2006.03.033 – ident: PhysRevLett.102.045003Cc22R1 doi: 10.1063/1.2936307 – ident: PhysRevLett.102.045003Cc8R1 doi: 10.1116/1.578679 – ident: PhysRevLett.102.045003Cc9R1 doi: 10.1016/0042-207X(96)80013-3 – volume-title: Ionized Physical Vapor Deposition year: 2000 ident: PhysRevLett.102.045003Cc20R1 contributor: fullname: J. A. Hopwood – ident: PhysRevLett.102.045003Cc23R1 doi: 10.1209/0295-5075/77/45002 – ident: PhysRevLett.102.045003Cc21R1 doi: 10.1063/1.373519 – volume-title: Proceedings of the 8th International Vacuum Congress year: 1980 ident: PhysRevLett.102.045003Cc7R1 contributor: fullname: N. Hosokawa – ident: PhysRevLett.102.045003Cc11R1 doi: 10.1063/1.2875523 – ident: PhysRevLett.102.045003Cc5R1 doi: 10.1016/j.tsf.2006.04.051 – ident: PhysRevLett.102.045003Cc12R1 doi: 10.1063/1.2938414 – volume-title: Kinetics of the Non-Equilibrium and Low-Temperature Plasma year: 1982 ident: PhysRevLett.102.045003Cc16R1 contributor: fullname: L. M. Biberman – volume-title: Gas Discharge Physics year: 1991 ident: PhysRevLett.102.045003Cc17R1 doi: 10.1007/978-3-642-61247-3 contributor: fullname: Y. P. Raizer – ident: PhysRevLett.102.045003Cc10R1 doi: 10.1063/1.2817812 – ident: PhysRevLett.102.045003Cc19R1 doi: 10.1116/1.2388954 – ident: PhysRevLett.102.045003Cc15R1 doi: 10.1088/0022-3727/24/4/001 |
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Snippet | When self-sputtering is driven far above the runaway threshold voltage, energetic electrons are made available to produce "excess plasma" far from the... When self-sputtering is driven far above the runaway threshold voltage, energetic electrons are made available to produce 'excess plasma' far from the... |
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SubjectTerms | CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS COPPER ELECTRIC POTENTIAL IONIZATION IONS MAGNETRONS PLASMA SPUTTERING SUBSTRATES TAIL ELECTRONS |
Title | Self-sputtering far above the runaway threshold: an extraordinary metal-ion generator |
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