An investigation of the role of plasma conditions on the deposition rate of electrochromic vanadium oxide thin films

Plasma-enhanced chemical vapor deposition (PECVD) has been used to form amorphous vanadium oxide thin films from mixtures of VOCl 3, O 2, and H 2. The deposition rate was examined as a function of PECVD operating conditions. Growth rates were found to be first order in VOCl 3, and independent of bot...

Full description

Saved in:

Bibliographic Details
Published in:	Journal of non-crystalline solids Vol. 351; no. 24; pp. 1987 - 1994
Main Authors:	Seman, Michael, Marino, Joey, Yang, Wenli, Wolden, Colin A.
Format:	Journal Article
Language:	English
Published:	Amsterdam Elsevier B.V 01-08-2005 Elsevier
Subjects:	Amorphous semiconductors; glasses Condensed matter: electronic structure, electrical, magnetic, and optical properties Exact sciences and technology Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation Optical properties of specific thin films Physics 78.20.J O110 E160 66.30.D E162 P260 81.15.Gh 78.66 Vanadium oxides Growth rate Ionic conductivity Operating mode Electrochromism Deposition rate Amorphous state Thin films Electro-optical effects PECVD Absorption spectra
Online Access:	Get full text
Tags:	Add Tag No Tags, Be the first to tag this record!

Be the first to leave a comment!