High-efficiency AlGaN-based UV light-emitting diode on laterally overgrown AlN
Ultraviolet light-emitting diodes (UV-LEDs) with a peak wavelength of 335 nm were fabricated on AlN/sapphire templates. As templates for the fabrication of UV-LEDs, planar AlN and epitaxial laterally overgrown (ELO) AlN on sapphire (0 0 0 1) substrates were compared. The output power of UV-LEDs grow...
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Published in: | Journal of crystal growth Vol. 310; no. 7; pp. 2326 - 2329 |
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Main Authors: | , , , , , , , , , , |
Format: | Journal Article |
Language: | English |
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01-04-2008
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Abstract | Ultraviolet light-emitting diodes (UV-LEDs) with a peak wavelength of 335
nm were fabricated on AlN/sapphire templates. As templates for the fabrication of UV-LEDs, planar AlN and epitaxial laterally overgrown (ELO) AlN on sapphire (0
0
0
1) substrates were compared. The output power of UV-LEDs grown on ELO-AlN was 27 times higher than that of UV-LEDs on the planar AlN template. |
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AbstractList | Ultraviolet light-emitting diodes (UV-LEDs) with a peak wavelength of 335
nm were fabricated on AlN/sapphire templates. As templates for the fabrication of UV-LEDs, planar AlN and epitaxial laterally overgrown (ELO) AlN on sapphire (0
0
0
1) substrates were compared. The output power of UV-LEDs grown on ELO-AlN was 27 times higher than that of UV-LEDs on the planar AlN template. Ultraviolet light-emitting diodes (UV-LEDs) with a peak wavelength of 335 nm were fabricated on AlN/sapphire templates. As templates for the fabrication of UV-LEDs, planar AlN and epitaxial laterally overgrown (ELO) AlN on sapphire (0 0 0 1) substrates were compared. The output power of UV-LEDs grown on ELO-AlN was 27 times higher than that of UV-LEDs on the planar AlN template. |
Author | Kamiyama, Satoshi Iida, Kazuyoshi Bando, Akira Sugimura, Hiroki Nagamatsu, Kentaro Iwaya, Motoaki Akasaki, Isamu Amano, Hiroshi Tsuzuki, Hirotoshi Mori, Fumiaki Okada, Narihito |
Author_xml | – sequence: 1 givenname: Kentaro surname: Nagamatsu fullname: Nagamatsu, Kentaro email: m0741503@ccmailg.meijo-u.ac.jp organization: Faculty of Science and Technology, Meijo University, 1-501 Shiogamaguchi, Tempaku-ku, Nagoya 468-8502, Japan – sequence: 2 givenname: Narihito surname: Okada fullname: Okada, Narihito organization: Faculty of Science and Technology, Meijo University, 1-501 Shiogamaguchi, Tempaku-ku, Nagoya 468-8502, Japan – sequence: 3 givenname: Hiroki surname: Sugimura fullname: Sugimura, Hiroki organization: Faculty of Science and Technology, Meijo University, 1-501 Shiogamaguchi, Tempaku-ku, Nagoya 468-8502, Japan – sequence: 4 givenname: Hirotoshi surname: Tsuzuki fullname: Tsuzuki, Hirotoshi organization: Faculty of Science and Technology, Meijo University, 1-501 Shiogamaguchi, Tempaku-ku, Nagoya 468-8502, Japan – sequence: 5 givenname: Fumiaki surname: Mori fullname: Mori, Fumiaki organization: Faculty of Science and Technology, Meijo University, 1-501 Shiogamaguchi, Tempaku-ku, Nagoya 468-8502, Japan – sequence: 6 givenname: Kazuyoshi surname: Iida fullname: Iida, Kazuyoshi organization: Faculty of Science and Technology, Meijo University, 1-501 Shiogamaguchi, Tempaku-ku, Nagoya 468-8502, Japan – sequence: 7 givenname: Akira surname: Bando fullname: Bando, Akira organization: Corporate R&D Center, Showa-Denko K.K., 1-1-1 Ohodai, Midori-ku, Chiba 267-0056, Japan – sequence: 8 givenname: Motoaki surname: Iwaya fullname: Iwaya, Motoaki organization: Faculty of Science and Technology, Meijo University, 1-501 Shiogamaguchi, Tempaku-ku, Nagoya 468-8502, Japan – sequence: 9 givenname: Satoshi surname: Kamiyama fullname: Kamiyama, Satoshi organization: Faculty of Science and Technology, Meijo University, 1-501 Shiogamaguchi, Tempaku-ku, Nagoya 468-8502, Japan – sequence: 10 givenname: Hiroshi surname: Amano fullname: Amano, Hiroshi organization: Faculty of Science and Technology, Meijo University, 1-501 Shiogamaguchi, Tempaku-ku, Nagoya 468-8502, Japan – sequence: 11 givenname: Isamu surname: Akasaki fullname: Akasaki, Isamu organization: Faculty of Science and Technology, Meijo University, 1-501 Shiogamaguchi, Tempaku-ku, Nagoya 468-8502, Japan |
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Cites_doi | 10.1063/1.2745207 10.1063/1.2364460 10.1038/nature04760 10.1063/1.121907 10.1143/JJAP.45.8639 10.1143/JJAP.41.L450 10.1143/JJAP.44.7250 10.1143/JJAP.46.1458 |
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Keywords | 85.60.Jb 07.20.Ka 81.15.Gh B1. Nitrides B3. Light-emitting diodes A3. Metal-organic vapor phase epitaxy Output power Epitaxy Aluminium nitride Template reaction 81.15.Gh; 85.60.Jb; 07.20.Ka Epitaxial film Gallium nitride Light emitting diode Microelectronic fabrication Ultraviolet radiation MOVPE method A3. Metal-organic vapor phase epitaxy; B1. Nitrides; B3. Light-emitting diodes Optoelectronic device III-V semiconductors |
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Snippet | Ultraviolet light-emitting diodes (UV-LEDs) with a peak wavelength of 335
nm were fabricated on AlN/sapphire templates. As templates for the fabrication of... Ultraviolet light-emitting diodes (UV-LEDs) with a peak wavelength of 335 nm were fabricated on AlN/sapphire templates. As templates for the fabrication of... |
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SubjectTerms | A3. Metal-organic vapor phase epitaxy Applied sciences B1. Nitrides B3. Light-emitting diodes Cross-disciplinary physics: materials science; rheology Electronics Exact sciences and technology Materials Materials science Methods of deposition of films and coatings; film growth and epitaxy Microelectronic fabrication (materials and surfaces technology) Optoelectronic devices Physics Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices Vapor phase epitaxy; growth from vapor phase |
Title | High-efficiency AlGaN-based UV light-emitting diode on laterally overgrown AlN |
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