High-efficiency AlGaN-based UV light-emitting diode on laterally overgrown AlN

Ultraviolet light-emitting diodes (UV-LEDs) with a peak wavelength of 335 nm were fabricated on AlN/sapphire templates. As templates for the fabrication of UV-LEDs, planar AlN and epitaxial laterally overgrown (ELO) AlN on sapphire (0 0 0 1) substrates were compared. The output power of UV-LEDs grow...

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Published in:Journal of crystal growth Vol. 310; no. 7; pp. 2326 - 2329
Main Authors: Nagamatsu, Kentaro, Okada, Narihito, Sugimura, Hiroki, Tsuzuki, Hirotoshi, Mori, Fumiaki, Iida, Kazuyoshi, Bando, Akira, Iwaya, Motoaki, Kamiyama, Satoshi, Amano, Hiroshi, Akasaki, Isamu
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Language:English
Published: Amsterdam Elsevier B.V 01-04-2008
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Abstract Ultraviolet light-emitting diodes (UV-LEDs) with a peak wavelength of 335 nm were fabricated on AlN/sapphire templates. As templates for the fabrication of UV-LEDs, planar AlN and epitaxial laterally overgrown (ELO) AlN on sapphire (0 0 0 1) substrates were compared. The output power of UV-LEDs grown on ELO-AlN was 27 times higher than that of UV-LEDs on the planar AlN template.
AbstractList Ultraviolet light-emitting diodes (UV-LEDs) with a peak wavelength of 335 nm were fabricated on AlN/sapphire templates. As templates for the fabrication of UV-LEDs, planar AlN and epitaxial laterally overgrown (ELO) AlN on sapphire (0 0 0 1) substrates were compared. The output power of UV-LEDs grown on ELO-AlN was 27 times higher than that of UV-LEDs on the planar AlN template.
Ultraviolet light-emitting diodes (UV-LEDs) with a peak wavelength of 335 nm were fabricated on AlN/sapphire templates. As templates for the fabrication of UV-LEDs, planar AlN and epitaxial laterally overgrown (ELO) AlN on sapphire (0 0 0 1) substrates were compared. The output power of UV-LEDs grown on ELO-AlN was 27 times higher than that of UV-LEDs on the planar AlN template.
Author Kamiyama, Satoshi
Iida, Kazuyoshi
Bando, Akira
Sugimura, Hiroki
Nagamatsu, Kentaro
Iwaya, Motoaki
Akasaki, Isamu
Amano, Hiroshi
Tsuzuki, Hirotoshi
Mori, Fumiaki
Okada, Narihito
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  givenname: Kentaro
  surname: Nagamatsu
  fullname: Nagamatsu, Kentaro
  email: m0741503@ccmailg.meijo-u.ac.jp
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  givenname: Narihito
  surname: Okada
  fullname: Okada, Narihito
  organization: Faculty of Science and Technology, Meijo University, 1-501 Shiogamaguchi, Tempaku-ku, Nagoya 468-8502, Japan
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  givenname: Hiroki
  surname: Sugimura
  fullname: Sugimura, Hiroki
  organization: Faculty of Science and Technology, Meijo University, 1-501 Shiogamaguchi, Tempaku-ku, Nagoya 468-8502, Japan
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  givenname: Hirotoshi
  surname: Tsuzuki
  fullname: Tsuzuki, Hirotoshi
  organization: Faculty of Science and Technology, Meijo University, 1-501 Shiogamaguchi, Tempaku-ku, Nagoya 468-8502, Japan
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  givenname: Fumiaki
  surname: Mori
  fullname: Mori, Fumiaki
  organization: Faculty of Science and Technology, Meijo University, 1-501 Shiogamaguchi, Tempaku-ku, Nagoya 468-8502, Japan
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  givenname: Kazuyoshi
  surname: Iida
  fullname: Iida, Kazuyoshi
  organization: Faculty of Science and Technology, Meijo University, 1-501 Shiogamaguchi, Tempaku-ku, Nagoya 468-8502, Japan
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  givenname: Akira
  surname: Bando
  fullname: Bando, Akira
  organization: Corporate R&D Center, Showa-Denko K.K., 1-1-1 Ohodai, Midori-ku, Chiba 267-0056, Japan
– sequence: 8
  givenname: Motoaki
  surname: Iwaya
  fullname: Iwaya, Motoaki
  organization: Faculty of Science and Technology, Meijo University, 1-501 Shiogamaguchi, Tempaku-ku, Nagoya 468-8502, Japan
– sequence: 9
  givenname: Satoshi
  surname: Kamiyama
  fullname: Kamiyama, Satoshi
  organization: Faculty of Science and Technology, Meijo University, 1-501 Shiogamaguchi, Tempaku-ku, Nagoya 468-8502, Japan
– sequence: 10
  givenname: Hiroshi
  surname: Amano
  fullname: Amano, Hiroshi
  organization: Faculty of Science and Technology, Meijo University, 1-501 Shiogamaguchi, Tempaku-ku, Nagoya 468-8502, Japan
– sequence: 11
  givenname: Isamu
  surname: Akasaki
  fullname: Akasaki, Isamu
  organization: Faculty of Science and Technology, Meijo University, 1-501 Shiogamaguchi, Tempaku-ku, Nagoya 468-8502, Japan
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Cites_doi 10.1063/1.2745207
10.1063/1.2364460
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Issue 7
Keywords 85.60.Jb
07.20.Ka
81.15.Gh
B1. Nitrides
B3. Light-emitting diodes
A3. Metal-organic vapor phase epitaxy
Output power
Epitaxy
Aluminium nitride
Template reaction
81.15.Gh; 85.60.Jb; 07.20.Ka
Epitaxial film
Gallium nitride
Light emitting diode
Microelectronic fabrication
Ultraviolet radiation
MOVPE method
A3. Metal-organic vapor phase epitaxy; B1. Nitrides; B3. Light-emitting diodes
Optoelectronic device
III-V semiconductors
Language English
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Elsevier
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Snippet Ultraviolet light-emitting diodes (UV-LEDs) with a peak wavelength of 335 nm were fabricated on AlN/sapphire templates. As templates for the fabrication of...
Ultraviolet light-emitting diodes (UV-LEDs) with a peak wavelength of 335 nm were fabricated on AlN/sapphire templates. As templates for the fabrication of...
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SubjectTerms A3. Metal-organic vapor phase epitaxy
Applied sciences
B1. Nitrides
B3. Light-emitting diodes
Cross-disciplinary physics: materials science; rheology
Electronics
Exact sciences and technology
Materials
Materials science
Methods of deposition of films and coatings; film growth and epitaxy
Microelectronic fabrication (materials and surfaces technology)
Optoelectronic devices
Physics
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Vapor phase epitaxy; growth from vapor phase
Title High-efficiency AlGaN-based UV light-emitting diode on laterally overgrown AlN
URI https://dx.doi.org/10.1016/j.jcrysgro.2007.11.152
https://search.proquest.com/docview/32981685
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