Photoconductivity of DLC film deposited by pulsed discharge plasma CVD

DLC films were deposited by a new pulsed DC discharge plasma chemical vapour deposition (CVD) using hydrogen and methane gas mixture. When methane concentration (Cm) i.e. CH 4/(H 2 + CH 4) was increased from 3 to 40%, the graphitization of the carbon film increases as evident from Raman study. When...

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Bibliographic Details
Published in:Diamond and related materials Vol. 17; no. 4; pp. 676 - 679
Main Authors: Kawai, S., Shinagawa, T., Noda, M., Umeno, M.
Format: Journal Article Conference Proceeding
Language:English
Published: Amsterdam Elsevier B.V 01-04-2008
Elsevier
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Summary:DLC films were deposited by a new pulsed DC discharge plasma chemical vapour deposition (CVD) using hydrogen and methane gas mixture. When methane concentration (Cm) i.e. CH 4/(H 2 + CH 4) was increased from 3 to 40%, the graphitization of the carbon film increases as evident from Raman study. When Cm was increased to 30%, DLC film shows photoconducting property. The white light photoconductivity ( S = I l/ I d, where I l is light current and I d is dark current) measured with solar simulator under AM 1.5 condition was approximately 20 at room temperature. The photoconductivity was not clear when Cm was lower than 20%. ESR measurements also show that the electron spin density was slightly decreased with decreasing concentration of methane. Thus we can conclude here that at higher concentrations of methane at 30%, Sp 2 content of the film increases and the DLC film becomes photoconducting.
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ISSN:0925-9635
1879-0062
DOI:10.1016/j.diamond.2008.01.085