Material engineering of percolating silicon nanowire networks for reliable and efficient electronic devices

Motivated to produce reliable and performant SiNW-based transistors, we present in this work how percolating networks composed of randomly oriented SiNWs, called nanonets, are a promising material if they are well engineered. We demonstrate that a proper material engineering of nanonets via alumina...

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Published in:Materials chemistry and physics Vol. 238; p. 121871
Main Authors: Legallais, Maxime, Nguyen, Thi Thu Thuy, Cazimajou, Thibauld, Mouis, Mireille, Salem, Bassem, Ternon, Céline
Format: Journal Article
Language:English
Published: Lausanne Elsevier B.V 01-12-2019
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Abstract Motivated to produce reliable and performant SiNW-based transistors, we present in this work how percolating networks composed of randomly oriented SiNWs, called nanonets, are a promising material if they are well engineered. We demonstrate that a proper material engineering of nanonets via alumina encapsulation allows to drastically enhance the electrical characteristics of back gate field effect transistors (FETs). Based on a simple, low temperature (≤400 °C) and up-scalable process of integration, the fabricated FETs exhibit a low off-current in the picoampere range while maintaining very good on-performance, up to the microampere and thus on-to-off ratio exceeding 105. As stated in this work, these nanonet-FETs present not only comparable electrical performances to reported single SiNW-based transistors with the same back-gated architecture but also good device-to-device reproducibility. This initial benchmarking clearly indicates that Si nanonet-based devices display essential features in terms of performances and fabrication process for sensing and flexible electronics. [Display omitted] •Alumina encapsulation is introduced as an efficient material engineering method•Encapsulation drastically enhances the electrical properties of Si nanowire networks•Studies of electrical properties were carried out by statistical characterizations•Benchmarking of nanonet-based devices against single silicon nanowire ones is done•Nanonet devices offer major breakthroughs in terms of elaboration and performance
AbstractList Motivated to produce reliable and performant SiNW-based transistors, we present in this work how percolating networks composed of randomly oriented SiNWs, called nanonets, are a promising material if they are well engineered. We demonstrate that a proper material engineering of nanonets via alumina encapsulation allows to drastically enhance the electrical characteristics of back gate field effect transistors (FETs). Based on a simple, low temperature (≤400 °C) and up-scalable process of integration, the fabricated FETs exhibit a low off-current in the picoampere range while maintaining very good on-performance, up to the microampere and thus on-to-off ratio exceeding 105. As stated in this work, these nanonet-FETs present not only comparable electrical performances to reported single SiNW-based transistors with the same back-gated architecture but also good device-to-device reproducibility. This initial benchmarking clearly indicates that Si nanonet-based devices display essential features in terms of performances and fabrication process for sensing and flexible electronics.
Motivated to produce reliable and performant SiNW-based transistors, we present in this work how percolating networks composed of randomly oriented SiNWs, called nanonets, are a promising material if they are well engineered. We demonstrate that a proper material engineering of nanonets via alumina encapsulation allows to drastically enhance the electrical characteristics of back gate field effect transistors (FETs). Based on a simple, low temperature (≤400 °C) and up-scalable process of integration, the fabricated FETs exhibit a low off-current in the picoampere range while maintaining very good on-performance, up to the microampere and thus on-to-off ratio exceeding 105. As stated in this work, these nanonet-FETs present not only comparable electrical performances to reported single SiNW-based transistors with the same back-gated architecture but also good device-to-device reproducibility. This initial benchmarking clearly indicates that Si nanonet-based devices display essential features in terms of performances and fabrication process for sensing and flexible electronics. [Display omitted] •Alumina encapsulation is introduced as an efficient material engineering method•Encapsulation drastically enhances the electrical properties of Si nanowire networks•Studies of electrical properties were carried out by statistical characterizations•Benchmarking of nanonet-based devices against single silicon nanowire ones is done•Nanonet devices offer major breakthroughs in terms of elaboration and performance
ArticleNumber 121871
Author Legallais, Maxime
Salem, Bassem
Cazimajou, Thibauld
Ternon, Céline
Nguyen, Thi Thu Thuy
Mouis, Mireille
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  givenname: Bassem
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  surname: Salem
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  givenname: Céline
  orcidid: 0000-0001-8890-4239
  surname: Ternon
  fullname: Ternon, Céline
  email: celine.ternon@grenoble-inp.fr
  organization: Univ. Grenoble Alpes, CNRS, Grenoble INP (Institute of engineering Univ. Grenoble Alpes), LMGP, F-38000, Grenoble, France
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Keywords Field effect transistor
Percolating network
Electrical characterizations
Silicon nanowire
Alumina encapsulation
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Snippet Motivated to produce reliable and performant SiNW-based transistors, we present in this work how percolating networks composed of randomly oriented SiNWs,...
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StartPage 121871
SubjectTerms Alumina encapsulation
Aluminum oxide
Display devices
Electrical characterizations
Electronic devices
Engineering Sciences
Field effect transistor
Field effect transistors
Flexible components
Low temperature
Micro and nanotechnologies
Microelectronics
Nanowires
Percolating network
Percolation
Semiconductor devices
Silicon
Silicon nanowire
Transistors
Title Material engineering of percolating silicon nanowire networks for reliable and efficient electronic devices
URI https://dx.doi.org/10.1016/j.matchemphys.2019.121871
https://www.proquest.com/docview/2312781093
https://hal.univ-grenoble-alpes.fr/hal-02332991
Volume 238
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