Effect of target properties on deposition of lithium nickel cobalt oxide thin-films using RF magnetron sputtering

Electrochemically active lithium nickel cobalt oxide thin-film has not been fabricated until now. To fabricate stoichiometric lithium nickel cobaltate films, a sputtering target of proper composition has been synthesized via a solid-state reaction. The films are deposited by RF magnetron sputtering...

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Bibliographic Details
Published in:Journal of power sources Vol. 108; no. 1; pp. 239 - 244
Main Authors: Kim, Duksu, Kim, Mun-Kyu, Son, Jong-Tae, Kim, Ho-Gi
Format: Journal Article
Language:English
Published: Lausanne Elsevier B.V 01-06-2002
Elsevier Sequoia
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Summary:Electrochemically active lithium nickel cobalt oxide thin-film has not been fabricated until now. To fabricate stoichiometric lithium nickel cobaltate films, a sputtering target of proper composition has been synthesized via a solid-state reaction. The films are deposited by RF magnetron sputtering at room temperature. As-deposited films show an amorphous structure. By varying the deposition conditions—such as the working pressures and deposition times—thin-films with different characteristics are produced. The relationship between physical characteristics and electrochemical properties is investigated. A crystallized thin-film prepared by an annealing method displays a good discharge capacity and cycle life.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:0378-7753
1873-2755
DOI:10.1016/S0378-7753(02)00025-3