Effect of target properties on deposition of lithium nickel cobalt oxide thin-films using RF magnetron sputtering
Electrochemically active lithium nickel cobalt oxide thin-film has not been fabricated until now. To fabricate stoichiometric lithium nickel cobaltate films, a sputtering target of proper composition has been synthesized via a solid-state reaction. The films are deposited by RF magnetron sputtering...
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Published in: | Journal of power sources Vol. 108; no. 1; pp. 239 - 244 |
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Main Authors: | , , , |
Format: | Journal Article |
Language: | English |
Published: |
Lausanne
Elsevier B.V
01-06-2002
Elsevier Sequoia |
Subjects: | |
Online Access: | Get full text |
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Summary: | Electrochemically active lithium nickel cobalt oxide thin-film has not been fabricated until now. To fabricate stoichiometric lithium nickel cobaltate films, a sputtering target of proper composition has been synthesized via a solid-state reaction. The films are deposited by RF magnetron sputtering at room temperature. As-deposited films show an amorphous structure. By varying the deposition conditions—such as the working pressures and deposition times—thin-films with different characteristics are produced. The relationship between physical characteristics and electrochemical properties is investigated. A crystallized thin-film prepared by an annealing method displays a good discharge capacity and cycle life. |
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Bibliography: | ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23 |
ISSN: | 0378-7753 1873-2755 |
DOI: | 10.1016/S0378-7753(02)00025-3 |